SputteringIn physics, sputtering is a phenomenon in which microscopic particles of a solid material are ejected from its surface, after the material is itself bombarded by energetic particles of a plasma or gas. It occurs naturally in outer space, and can be an unwelcome source of wear in precision components. However, the fact that it can be made to act on extremely fine layers of material is utilised in science and industry—there, it is used to perform precise etching, carry out analytical techniques, and deposit thin film layers in the manufacture of optical coatings, semiconductor devices and nanotechnology products.
Pulsed laser depositionPulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.
Chemical elementA chemical element is a chemical substance that cannot be broken down into other substances. The basic particle that constitutes a chemical element is the atom, and each chemical element is distinguished by the number of protons in the nuclei of its atoms, known as its atomic number. For example, oxygen has an atomic number of 8, meaning that each oxygen atom has 8 protons in its nucleus. This is in contrast to chemical compounds and mixtures, which contain atoms with more than one atomic number.
Sputter depositionSputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K).
Coordination complexA coordination complex is a chemical compound consisting of a central atom or ion, which is usually metallic and is called the coordination centre, and a surrounding array of bound molecules or ions, that are in turn known as ligands or complexing agents. Many metal-containing compounds, especially those that include transition metals (elements like titanium that belong to the periodic table's d-block), are coordination complexes. Coordination complexes are so pervasive that their structures and reactions are described in many ways, sometimes confusingly.
Chemical symbolChemical symbols are the abbreviations used in chemistry for chemical elements, functional groups and chemical compounds. Element symbols for chemical elements normally consist of one or two letters from the Latin alphabet and are written with the first letter capitalised. Earlier symbols for chemical elements stem from classical Latin and Greek vocabulary. For some elements, this is because the material was known in ancient times, while for others, the name is a more recent invention.
Physical vapor depositionPhysical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.
Names for sets of chemical elementsThere are currently 118 known chemical elements exhibiting many different physical and chemical properties. Amongst this diversity, scientists have found it useful to use names for various sets of elements, that illustrate similar properties, or their trends of properties. Many of these sets are formally recognized by the standards body IUPAC. The following collective names are recommended by IUPAC: Alkali metals – The metals of group 1: Li, Na, K, Rb, Cs, Fr. Alkaline earth metals – The metals of group 2: Be, Mg, Ca, Sr, Ba, Ra.
Chemical compoundA chemical compound is a chemical substance composed of many identical molecules (or molecular entities) containing atoms from more than one chemical element held together by chemical bonds. A molecule consisting of atoms of only one element is therefore not a compound. A compound can be transformed into a different substance by a chemical reaction, which may involve interactions with other substances. In this process, bonds between atoms may be broken and/or new bonds formed.
Abundance of the chemical elementsThe abundance of the chemical elements is a measure of the occurrence of the chemical elements relative to all other elements in a given environment. Abundance is measured in one of three ways: by mass fraction (in commercial contexts often called weight fraction), by mole fraction (fraction of atoms by numerical count, or sometimes fraction of molecules in gases), or by volume fraction. Volume fraction is a common abundance measure in mixed gases such as planetary atmospheres, and is similar in value to molecular mole fraction for gas mixtures at relatively low densities and pressures, and ideal gas mixtures.
