Single crystal diamond micro-disk resonators by focused ion beam milling
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A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes a ...
Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical parameters during etching of RuO2 and Pr by a dual frequency ECR/RF reactor have been investigated. The ...
Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical mechanisms during platinum etching by a dual frequency ECR/RF reactor have been investigated. An ion be ...
Spin-coated solid films of the gold-cluster compd. dodeca-(triphenylphosphine), hexa(chloro)pentapentacontagold Au55(PPh3)12Cl6 are irradiated with a focused 20-keV Ga+ focused-ion beam. Writing speeds on the substrate ranged from 50 up to 2000 mm/s. This ...
The authors report on the in-situ growth over large area of high-quality homogeneous YBa2Cu3O7-x films by single target ion beam sputtering. The 123 stoichiometry transfer to the substrates is obtained by using sufficiently low power ion beams and a grazin ...
Selective Ga + ion implantation and miring by focused ion beam exposure and subsequent wet chemical etching is used to fabricate micro/nanomechanical elements in Si. Freestanding elements with a ~ 30 nm membrane thickness are made by controlled selective u ...
Spin-coated solid films of the gold-cluster compd. dodeca-(triphenylphosphine), hexa(chloro)pentapentacontagold Au55(PPh3)12Cl6 are irradiated with a focused 20-keV Ga+ focused-ion beam. Writing speeds on the substrate ranged from 50 up to 2000 mm/s. This ...