Single crystal diamond micro-disk resonators by focused ion beam milling
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Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical parameters during etching of RuO2 and Pr by a dual frequency ECR/RF reactor have been investigated. The ...
Selective Ga + ion implantation and miring by focused ion beam exposure and subsequent wet chemical etching is used to fabricate micro/nanomechanical elements in Si. Freestanding elements with a ~ 30 nm membrane thickness are made by controlled selective u ...
Spin-coated solid films of the gold-cluster compd. dodeca-(triphenylphosphine), hexa(chloro)pentapentacontagold Au55(PPh3)12Cl6 are irradiated with a focused 20-keV Ga+ focused-ion beam. Writing speeds on the substrate ranged from 50 up to 2000 mm/s. This ...
Spin-coated solid films of the gold-cluster compd. dodeca-(triphenylphosphine), hexa(chloro)pentapentacontagold Au55(PPh3)12Cl6 are irradiated with a focused 20-keV Ga+ focused-ion beam. Writing speeds on the substrate ranged from 50 up to 2000 mm/s. This ...
The authors report on the in-situ growth over large area of high-quality homogeneous YBa2Cu3O7-x films by single target ion beam sputtering. The 123 stoichiometry transfer to the substrates is obtained by using sufficiently low power ion beams and a grazin ...
Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical mechanisms during platinum etching by a dual frequency ECR/RF reactor have been investigated. An ion be ...
A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes a ...
