Publication

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

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Laser-Induced Forward Transfer of Functional Microdevices

Zhiwei Yang

Laser-induced forward transfer (LIFT) technique is an emerging micro additive manufacturing (AM) technique that has been widely used to print a variety of materials. Distinguished from other nozzle-based AM techniques, LIFT operates without the existence o ...

EPFL2023

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Self-organizing patterns with micrometer-scale features are promising for applications in photonics and bioengineering. Their spontaneous formation reduces the number of required processing steps. Here, we report an approach to spontaneously form stochasti ...

2021

FABRICATION AND ANALYSIS OF THIN FILM LITHUM NIOBATE RESONATORS FOR 5GHz FREQUENCY AND LARGE k(t)(2) APPLICATIONS

Luis Guillermo Villanueva Torrijo, Seniz Esra Küçük, Soumya Yandrapalli, Victor Plessky

This work presents the fabrication and analysis of suspended thin film Lithium Niobate resonators. The yield of the new fabrication process presented below is >90% showing devices with high k(t)(2) of 28% resonators at 5GHz, making them suitable for high f ...

IEEE2021

Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

A high-power LED-based illumination system has been developed as a replacement for the mercury arc lamps used in mask-aligner lithography. LEDs are arranged in a grid array and placed in the entrance aperture of individual reflectors. Those reflectors decr ...

SPIE2019

On Advanced Large-Field Photolithography

Raoul Kirner

The information age we live in today relies on highly integrated devices. They are fabricated with the help of photolithography, the patterning technique at the heart of their production. With the continuous demand for higher integration density to achieve ...

EPFL2019

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Toralf Scharf, Wilfried Noell, Chen Yan, Raoul Kirner, Andreas Vetter

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

2019

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Single-photon avalanche diodes (SPADs) are direct photon-to-digital detectors that enable scalable arrays with Poisson-limited signal-to-noise ratio and picosecond timing resolution. However, SPAD detectors require a guard-ring structure to prevent lateral ...

2019

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Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

2018

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Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

2018

High power ultraviolet LED illumination systems: coherence properties and applications in photolithography

Johana Bernasconi

Mask-aligner photolithography is a technology used to replicate patterns from a mask to a photosensitive substrate. It is widely used in the fabrication of MEMS and micro-optical components, and for other applications with dimensions in the micrometer rang ...

EPFL2018