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High power modular LED-based illumination system for lithography applications
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OPTICAL SOC AMER2020Spatial coherence properties of an LED-based illumination system for mask-aligner lithography
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A high-power LED-based illumination system has been developed as a replacement for the mercury arc lamps used in mask-aligner lithography. LEDs are arranged in a grid array and placed in the entrance aperture of individual reflectors. Those reflectors decr ...
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In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...
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The information age we live in today relies on highly integrated devices. They are fabricated
with the help of photolithography, the patterning technique at the heart of their production.
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EPFL2019