Philippe Renaud, Arnaud Bertsch
IB-LIGA (Ion Beam Lithographie, Galvanoformung and Abformung) is a new technique for the 3D structuring of photoresist materials. It is a direct-write (maskless) technique that uses high energy (0.5-3.5 McV) light ions (protons or helium ions) for the irra ...
2003