Atomic Layer Deposition on Dispersed Materials in Liquid Phase by Stoichiometrically Limited Injections
Graph Chatbot
Chat with Graph Search
Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.
DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.
Multilayered niobium oxynitride films were deposited onto (100) Si using DC magnetron sputtering with a reactive gas pulsing process. The argon and nitrogen flows were kept constant during sputtering of a pure niobium target and the oxygen flow was pulsed ...
Strontium barium niobate (SrxBa1-xNb2O6, shortly SBN) is a solid solution system with tetragonal tungsten bronze crystal structure. It exhibits a ferroelectric phase with only one polar axis and a transition temperature depending on the Sr/Ba ratio. This t ...
Results are presented for heat loads at the TCV outer divertor target during ELMing H-mode using a fast IR camera. Benefitting from a recent surface cleaning of the entire first wall graphite armour, a comparison of the transient thermal response of freshl ...
Al2O3 films are grown by atomic layer deposition (ALD) using trimethylaluminum and water as precursors on HF-last and NH3 plasma pretreatment Si substrates. The thickness, surface roughness, and density of Al2O3 films as well as the nature of their interla ...
Nanocomposite thin films exhibit interesting optical properties which differ from those of the pure constituents. Effective medium theories are used to model the dielectric function of the nanocomposite materials. We give an introduction to the theories of ...
Ta2O5 thin films were produced by metallo-organic low pressure chemical vapor deposition using Tantalum(V) Tetraethoxydimethylaminoethoxide (TaC12H30O5N) as precursor. This liquid precursor at room temperature makes it possible to deposit thin films of Ta2 ...
Cluster calculations employing hybrid density functional theory have been carried out to examine the initial surface reactions in atomic layer deposition (ALD) of TiN thin films on the SiO2 surface using TiCl4 and NH3 as precursors. The potential energy su ...
The coupling and transmission of transverse and longitudinal fields into apertureless microfabricated near-field optical probes is investigated. Two kinds of probes with different metal coating roughness are considered. Transverse and longitudinal field di ...
Erbium-doped amorphous aluminum oxide layers deposited on Si or oxidized silicon substrates are promising construction pieces for future monolytic integrated optoelectronics devices. In a novel high-vacuum chemical vapor deposition setup the alumina films ...
Properties of thin films such as the crystallinity of silicon deposited from SiH4 - H-2 discharges are governed by the plasma composition. Therefore, it is crucial to measure the plasma composition in order to understand and optimize the deposition rate, d ...