Nouvelles technologies de microstructuration de type UV-LIGA et fabrication de composants micromécaniques
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International Society for Optics and Photonics2010
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We propose a novel lithography method based on local deposition through miniature shadow-masks (nanostencils) for the fabrication of silicon based nanoelectronics devices. The method allows patterning of sub 100nm scale metal structures in a reproducible w ...
2005
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2005
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2005
In this paper, the design and the characterization of batch fabricated SixNy micropipette arrays with diameters ranging from 6 νm down to 250 nm are described. The process used to fabricate the micromachined pipettes includes a deep reactive ion etching st ...
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