Elison de Nazareth Matioli, Jun Ma, Luca Nela, Catherine Erine, Minghua Zhu, Pirouz Sohi, Mohammad Samizadeh Nikooytabalvandani
In this letter, we present a new concept for normally-off AlGaN/GaN-on-Si MOS-HEMTs based on the combination of p-GaN, tri-gate and MOS structures to achieve high threshold voltage (V-TH) and low on-resistance (R-ON). The p-GaN is used to engineer the band ...
Institute of Electrical and Electronics Engineers2021
