SUB-MICRON SCALE PATTERN TRANSFER INTO POLYMERS BY THERMAL IMPRINT LITHOGRAPHY
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Increased flexibility in patterning becomes important for the engineering of advanced nano/micro-electro-mechanical systems (NEMS/MEMS). Surfaces to be structured are either mechanically unstable and/or (bio-) chemically functionalized, such as ultra-thin ...
A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes a ...
A rapid and simple method to fabricate tiny shadow-masks and their use in multi-layer surface patterning with in situ micromechanical alignment is presented. Instead of using silicon micromachining with through-wafer etching to define the thin membrane wit ...
A low temperature method of bonding two polymer sheets (2, 3) without adhesive, at least one of said polymer sheets comprising a microstructure (1) or a network of microstructures, comprises the steps of treating at least a portion of one surface of one of ...
A carbon-based interdigitated electrode array (IDA) was fabricated by photolithographic patterning of RF sputtered thin-film carbon layers. The IDAs consisted of 125 pairs having the finger width of 2.5 μm and 1.5 μm gap. The electrochemical behavior of th ...
A dual element, point, infra-red detector is being developed from a sol-gel deposited PbTiO3 thin-film on a micro-machined silicon substrate. Patterning of the ferroelectric film and the electrodes is accomplished by photolithographic techniques. Membranes ...
This paper presents a microsystem consisting of an overhanging xy-microstage with integrated tip and comb actuators for scanning surface profiling. The design is optimized with respect to precise xy positioning at low drive voltages and accurate detection ...
We present an optical investigation of GaN pillars using both micro-Raman (mu-Raman) and microphotoluminescence (mu-PL) spectroscopy. GaN pillars of diameter ranging from 100 nm to 5 mum were fabricated by electron beam lithography and reactive ion etching ...
A new approach for the realization Of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...
A new approach for the realization of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...