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Data coding tools for color-coded vector nanolithography

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Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The ap ...

Transducers2007

Fault-Tolerant Multi-Level Logic Decoder for Nanoscale Crossbar Memory Arrays

Giovanni De Micheli, Mihai Adrian Ionescu, David Atienza Alonso, Didier Bouvet, Kirsten Emilie Moselund, Yusuf Leblebici

Several technologies with sub-lithographic features are targeting the fabrication of crossbar memories in which the nanowire decoder is playing a major role. In this paper, we suggest a way to reduce the decoder size and keep it defect tolerant by using mu ...

2007

Massively parallel AFM with digital holographic readout

Laurent Sache

The general idea of Nanotechnology is not new – it has been studied since Nobel laureate Richard Feynman outlined the idea in a speech in 1959 – but it's only recently that the progress carried out in the various fields of material, optic, physic and engin ...

EPFL2006

Is Process or Architecture the Solution?

James Richard Larus

The call for papers for this workshop starts with the observation that software still has bugs, despite considerable investment and improvement in software development process. Software has always had bugs, and as far as I can tell, it will always have bug ...

ACM2006

SETTING-UP AND EVALUATION OF UV-IMPRINT LITHOGRAPHY

Jürgen Brugger, Thomas Kiefer, Nao Takano

UV-imprint lithography has attracted attentions since its invention in 1996 together with thermal imprint lithography, which are so-called nanoimprint lithography (NIL). One of the characteristics of UV-imprint lithography is that a polymer layer to be str ...

2006

Dynamic Stencil Lithography

Recent developments are going towards miniaturized devices and structures. Besides advanced photolithography techniques, complementary patterning methods are evolving. Among them is the nanostencil technique. This technique is about defining patterns under ...

2006

Liquid Crystal Alignment Chemical Nanopatterns : Control over Azimuthal and Polar Alignment

Toralf Scharf

We discuss alignment properties of nematic liquid crystals on surfaces that contain homeotropic and planar alignment areas on the same surface substrate. The basic idea is to locally pattern homeotropic agents (silane) on surfaces that usually lead to plan ...

2005

Optofluidics

Demetri Psaltis

"Optofluidics" is the marriage of optics, optoelectronics and nanophotonics with fluidics. Such integration represents a new approach for dynamic manipulation of optical properties at length scales both greater than and smaller than the wavelength of light ...

2005

Patterning of micro- and nanometer scale structures by means of nanostencils (shadow masks) is increasingly being used as a simple, clean and low-cost alternative to photolithography. It can be shown, that sub-100-nm scale features can be fabricated throug ...

2005

Recent developments are going towards miniaturized devices and structures. Besides advanced photolithography techniques, complementary patterning methods are evolving. Among them is the nanostencil technique. Schematic overview of setup in operation: the s ...

2005