Philippe RenaudPhilippe Renaud is Professor at the Microsystem Laboratory (LMIS4) at EPFL. He is also the scientific director of the EPFL Center of MicroNanoTechnology (CMI). His main research area is related to micronano technologies in biomedical applications (BioMEMS) with emphasis on cell-chips, nanofluidics and bioelectronics. Ph. Renaud is invloved in many scientifics papers in his research area. He received his diploma in physics from the University of Neuchâtel (1983) and his Ph.D. degree from the University of Lausanne (1988). He was postdoctoral fellow at University of California, Berkeley (1988-89) and then at the IBM Zürich Research Laboratory in Switzerland (1990-91). In 1992, he joined the Sensors and Actuators group of the Swiss Center for Electronics and Microtechnology (CSEM) at Neuchâtel, Switzerland. He was appointed assistant professor at EPFL in 1994 and full professor in 1997. In summer 1996, he was visiting professor at the Tohoku University, Japan. Ph. Renaud is active in several scientific committee (scientific journals, international conferences, scientific advisory boards of companies, PhD thesis committee). He is also co-founder of the Nanotech-Montreux conference. Ph. Renaud is committed to valorization of basic research through his involvement in several high-tech start-up companies.
Cyrille HibertCyrille HIBERT received his diploma in Physics in 1994 and his PhD in 1998 from University of Orleans (FR). He then held a post doctoral position in GREMI laboratory at the University of Orleans in collaboration with Alcatel Vacuum Technology and ST Microelectronics, working in deep anisotropic etching of silicon with an Inductively Coupled Plasma reactor. In May 2000 he joined the EPFL-Center of Micro-Nano-technology where he was in charge of the plasma etching activities. He left EPFL in October 2003 for a sabbatical year to join the CFF group at NMRC (Ireland) now called Tyndall Institute. He worked on developing plasma processing. In October 2004, he came back to EPFL-CMI to be in charge of etching and nanotechnology activities (FIB and future ebeam litho).
