Concept

Perturbation atmosphérique

Publications associées (27)

Uniformity study in large-area showerhead reactors

Laurent Fabien Hubert Sansonnens, Raffaello Sobbia

Large area plasma-enhanced chemical vapor deposition of thin films such as silicon nitride or amorphous silicon is widely used for thin film transistor fabrication in the flat panel display industry. A numerical three-dimensional model to calculate the dep ...

2005

Calculation of the electrode shape for suppression of the standing wave effect in large area rectangular capacitively coupled reactors

Laurent Fabien Hubert Sansonnens

The electromagnetic standing wave becomes one of the main sources of plasma nonuniformity in large area capacitively coupled rf reactors. In cylindrical reactors with a central rf connection or one-dimensional linear reactors with rf connections at both ex ...

2005

Analytical and numerical modeling of an ultrasonic stepping motor using standing waves

Yves Perriard, José Fernandez Lopez

Piezoelectric motors (usually called ultrasonic) show interesting characteristics. Not only they deliver high torques at low speeds but their structure confers to them a braking torque without energy supply. This paper firstly present a list of possible so ...

2004

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Hannes Schmidt

Experiments using a lens-shaped circular electrode are described to measure the correction of plasma nonuniformity due to the standing wave effect in a large area very high frequency plasma reactor. This work is the experimental verification of the theoret ...

2004

Wall roughness effects on flow and scouring in curved channels with gravel bed

Wall roughness effects on flow and scouring in curved channels with gravel bed In the narrow valleys in Alpine regions, rivers frequently flow across constructed zones, passing through villages and cities. Due to limited space, the protection from high flo ...

EPFL2002

Glow discharge processing in the liquid crystal display industry

Laurent Fabien Hubert Sansonnens

The active matrix display industry is briefly presented. The most challenging aspect for plasma source design lies in the substrate size which is now entering the 1-2 m range. This paper focuses on the conventional planar RF capacitor at 13.56 MHz. A detai ...

2002

A voltage uniformity study in large-area reactors for RF plasma deposition

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens

Non-uniform voltage distribution across the electrode area results in inhomogeneous thin-film RF plasma deposition in large-area reactors. In this work, a two-dimensional analytic model for the calculation of the voltage distribution across the electrode a ...

1997

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