Concept

Lithographie

Publications associées (51)

Printing And Encapsulation Of Electrical Conductors On Polylactic Acid (Pla) For Sensing Applications

Nico de Rooij, Danick Briand, Andres Felipe Vasquez Quintero, Giorgio Mattana, Alexis Pierre Henri Marette, Nathalie Frolet

This paper presents the printing of resistive and interdigitated (IDE) capacitive devices for temperature and humidity sensing applications, respectively, on biodegradable polylactic acid (PLA) substrates. Inkjet and gravure printing were evaluated to tran ...

IEEE2014

Water adsorption on etched hydrophobic surfaces of L-, D- and DL-valine crystals

Juan José Segura Sugranes

The adsorption of water on etched (001) surfaces of L-, D- and DL-valine crystals has been characterized by atomic force microscopy (AFM) using different operational modes (contact, non-contact and electrostatic) above and below the dew point, the temperat ...

Elsevier2014

Application of stencil masks for ion beam lithographic patterning

Jürgen Brugger, Andreea Veronica Savu

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Elsevier2013

Reusable plasmonic substrates fabricated by interference lithography: a platform for systematic sensing studies

Olivier Martin, Thomas Gerd Siegfried

Surface-enhanced Raman scattering (SERS) has become increasingly popular in the scientific and industrial communities because of its analytical capabilities and potential to study fundamentals in plasmonics. Although under certain conditions extremely high ...

Wiley-Blackwell2013

Reflow Of Non-Circular Nano-Pillars To Fabricate Nano-Scale Solid Immersion Lenses

Hans Peter Herzig, Gaël David Osowiecki, Toralf Scharf, Myun Sik Kim

We investigate the reflow of non-circular, i.e., triangular and square, shaped pillars to fabricate nano-scale solid immersion lenses (SILs). Electron beam lithography (EBL) and thermal reflow are the core of the fabrication process. For the optical charac ...

Ieee2012

Reflow Of Non-Circular Nano-Pillars To Fabricate Nano-Scale Solid Immersion Lenses

Hans Peter Herzig, Toralf Scharf, Myun Sik Kim

Ieee2012

Development of Elastomeric Optofluidic Devices for Lasing and Sensing

Wuzhou Song

The term of optofluidics defines an emergent research field that combines microfluidics and optics. In many lab-on-a-chip applications, these two technologies are used in combining the microfluidics for sample delivery and optics for sensing and controllin ...

EPFL2012

Advances in Nanostenciling: resistless nanopatterning enables new applications

Jürgen Brugger, Andreea Veronica Savu

This paper presents the state-of-the-art of nanostencil as a direct and local patterning method. Stencil lithography is a high-resolution shadow mask technique that allows structuring surfaces without using the harsh process steps typically associated with ...

2011

Organic Pentacene Thin Film Transistors on Flexible Substrates Fabricated by Stencil Lithography

Katrin Sidler Arnet

This thesis presents the fabrication and characterization of organic thin film transistors (TFTs) on flexible polymer substrates and the development of compliant stencil lithography to significantly improve the patterning resolution on full-wafer scale. Po ...

EPFL2010

Sharp High-Aspect-Ratio AFM Tips Fabricated by a Combination of Deep Reactive Ion Etching and Focused Ion Beam Techniques

Luis Guillermo Villanueva Torrijo

The shape and dimensions of an atomic force microscope tip are crucial factors to obtain high resolution images at the nanoscale. When measuring samples with narrow trenches, inclined sidewalls near 90 or nanoscaled structures, standard silicon atomic forc ...

2010

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