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We present the local polymer infiltration of planar photonic crystal cavities via a maskless laser-writing technique. After the infiltration of the air holes with a UV-curable monomer a focused laser is used to locally polymerize the monomer in selected ho ...
We report on the fabrication and testing of a chip-scale plasma light source. The device consists of a stack of three anodically bonded Pyrex wafers, which hermetically enclose a gas-filled cavity in which electrodes are used to ignite a low power (≪500 mW ...
Ion beam LIGA allows the etching of 3D nano-structures by direct writing with a nano-sized beam. However, this is a relatively time consuming process. We propose here another approach for etching structures on large surfaces and faster, compared to the dir ...
The process comprises the step of deposition of a sensor and of a part or of the entirety of a treatment unit on a not necessarily planar conductive surface by a soft lithography technique. ...
We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion et ...
We demonstrate the nanofabrication of the transmission SU-8 gratings with periods from 200 nm (5000 lines/mm) to 1 lm (1000 lines/mm) with different trench depths for applications from near-infrared to deep-UV wavelength. The imprint property of SU-8 under ...
We present an experimental and theoretical study on the optical properties of arrays of gold nanoparticle in-tandem pairs (nanosandwiches). The well-ordered Au pairs with diameters down to 35 nm and separation distances down to 10 nm were fabricated using ...
Substrates with 1-dimensional nanosize grooves were prepared using extreme-ultraviolet interference lithography (EUV-IL), wherein gold nanoparticles were self-assembled to form 1-dimensional structures. To measure the electrical properties of gold nanopart ...
We present the fabrication of 150 nm half-pitch Si grating templates by reactive ion etch (RIE), which are used in nanoimprint lithography (NIL) for high groove density gratings in SU-8 plastic. The etch properties such as the etch rate, profile and etchin ...
This paper describes F-based dry etching and resulting surface properties of biocompatible silicone elastomer. The etch rate of polysiloxane and surface morphology was found to be highly temperature dependent. An increase in temperature results in a signif ...