Acide sulfurique | EPFL Graph Search

vignette|Effet de l'acide sulfurique sur une serviette en coton. vignette|Cloques emplies de lymphe résultant d'une brûlure causée par exposition de la peau à de l'acide sulfurique (archives médicales militaires de l'US Army, seconde guerre mondiale). L’acide sulfurique, appelé jadis huile de vitriol ou vitriol fumant, est un composé chimique de formule . C'est un acide minéral dont la force est seulement dépassée par quelques superacides. Il est miscible à l'eau en toutes proportions, où il se dissocie en libérant des cations hydronium : :2 + → 2 + . L'acide sulfurique est un produit industriel de première importance, qui trouve de très nombreuses applications, notamment dans les batteries au plomb pour les voitures et autres véhicules, le traitement des minerais, la fabrication des engrais, le raffinage du pétrole, le traitement des eaux usées et les synthèses chimiques. Issu de l'hydratation du trioxyde de soufre , lui-même résultant de l'oxydation naturelle du dioxyde de s

Atmospheric heterogeneous reactions of chlorine and bromine containing molecules

Arnaud Aguzzi

This thesis deals with a laboratory study of heterogeneous reactions involving bromine and chlorine containing reservoir species on alkali salt substrates which are relevant to the marine boundary layer, and on ice substrates which are relevant to the lower stratosphere. The aim is to obtain reliable data on uptake coefficients γ and reaction mechanisms for the sake of extrapolation of results obtained in the laboratory to atmospheric conditions. The experiments have been performed in a Teflon coated Knudsen flow reactor equipped with a quadrupole mass spectrometer. The reactions of BrONO2 with solid alkali halides have been studied at ambient temperature. The initial uptake coefficients γ0 of BrONO2 on NaCl and KBr substrates are γ0 = 0.31 ± 0.10 and γ0 = 0.32 ± 0.09, respectively. For NaCl substrates BrCl, Br2 and HCl and for KBr both Br2 and HBr are observed as products. HCl and HBr result from the interaction of NaCl and KBr, respectively, with HNO3 generated in the hydrolysis of BrONO2 with H2O condensed on the salt sample. Using NaCl we observed Br2 which is formed from heterogeneous BrONO2 decomposition occurring on solid KBr samples. Halogen exchange reactions are competing with hydrolysis and decomposition which also take place on non-reactive salts (NaNO3, Na2SO4). A high rate of initial uptake (0.2 ≤ γ0 ≤ 0.4) and a Br2 yield on the order of 50 % are observed on non-reactive salts with a closed mass balance for Br2. The ClONO2-salt system has been reinvestigated. Experiments on NaCl, KBr (reactive salts) and on NaNO3 and Na2SO4 (non-reactive salts) have been performed. The hydrolysis of ClONO2 was not observable in contrast to heterogeneous decomposition which occurred on non-reactive salts with a Cl2 yield of (25 ± 5) %. Calculations have been performed using a 0-D box model in order to observe the effects of heterogeneous chemistry on sea salt in the marine boundary layer. Chlorine and bromine chemistry is activated by heterogeneous reactions occurring on NaCl and KBr which are the sole sources of chlorine and bromine in the model. Simulations performed with chlorine heterogeneous chemistry and gas phase chemistry indicate: 1) Denitrification of the troposphere (NOy converted to solid nitrates). 2) Increase of the oxidative capacity of the troposphere by the release of Cl atoms. When bromine chemistry is added to the model, the recombination reaction of NO2 with BrO leads to an increase of tropospheric denitrification through formation of BrONO2. Calculations show that at high [NOx], the most important bromine reservoir is BrONO2, while at low [NOx] HOBr is the most important bromine reservoir. The uptake of HNO3 on ice, solid sulfuric acid solutions and solid ternary solutions (STS) has been investigated at 180 to 211 K. The uptake coefficient γ decreases from 0.30 at 180 K to 0.06 at 211 K. The Arrhenius representation shows two distinct regimes. The first at low temperatures (180-190 K) shows a constant value γ of 0.3, whereas the second regime at T > 195 K corresponds to an activation energy of Ea = -7 ± 1 kcal/mol. At a fixed temperature, γ is independent of [HNO3] thus confirming a rate law first order in [HNO3]. The γ values of HNO3 on H2SO4/H2O solid solutions linearly decreases from 0.20 (0.10) at 10 wt % H2SO4 to 0.05 (0.03) at 98 wt % H2SO4 at 180 K (200K). The γ values of HNO3 with STS of H2SO4/HNO3/H2O is equal to 0.10 ± 0.03 in the temperature range 185-195 K at conditions where the composition of the interface was held constant at the given temperature by adding an external flow of H2O. Br2O hydrolysis on ice surfaces occurs rapidly in the chosen temperature range of 180 to 210 K. At a fixed temperature the uptake kinetics follow an apparent first order rate law in [Br2O]. The observed negative temperature dependence leads to an activation energy Ea for heterogeneous hydrolysis of -2.3 ± 0.6 kcal/mol. These facts point towards a complex reaction mechanism implying that the interaction of Br2O with ice is not an elementary reaction. BrONO2 hydrolysis has been measured on bulk (B), condensed (C) and single crystal (SC) ice in the temperature range 180-210 K. On all types of ice, HOBr and Br2O are observed as products. At a fixed temperature the rate law is first order in [BrONO2] with γ ≈ 0.3 at 180 K. The observed negative temperature dependence leads to an activation energy Ea for the hydrolysis of BrONO2 on pure ice of -2.0 ± 0.2, -2.1 ± 0.2 and -6.6 ± 0.3 kcal/mol on (C), (B) and (SC) ice, respectively, pointing towards different kinetics of BrONO2 on these different types of ice. Doping the ice samples with HBr leads to the formation of Br2, preceded by BrONO2 hydrolysis. The Arrhenius representation corresponds to an activation energy of Ea = -1.2 ± 0.2 kcal/mol. We investigated the structural properties of the near-surface region of various types of HX (X = Cl or Br) doped ice. Basically, we studied the time dependent [HX] in the interface region using the fast reaction titration XONO2 + HX → X2 + HNO3. These experiments reveal that HX is located near the surface of the substrate in a well defined region of thickness I. The HX molecules composing the interface are immediately available for the titration reaction, whatever the flow of XONO2. In the temperature range 190-200 K, we measured a value of IHCl = 43 ± 16, 250 ± 50 and 444 ± 120 nm for (SC), (C) and (B) ices, respectively and IHBr = 110 ± 15 nm on (C) ice at 205K. Finally, we assessed the bulk diffusion coefficient for HX, DHX by modeling our results according to Fick's laws of diffusion. We obtained values of DHCl = 4.5·10-15 - 1.0·10-12 cm2/s at 190 K and DHBr = (6.5 ± 3.0)·10-15 cm2/s at 205 K.

EPFL2001

Stability and physical properties of alkylsilane and alkylphosphonate self-assembled monolayer (SAM) films on metal oxide substrates characterized at the micro- and nanoscale

Enamul Hoque

Self-assembled monolayer (SAM) films have attracted immense attention for both fundamental and applied research. A SAM is composed of a large number of molecules with a head group that chemisorbs onto a substrate, a tail group that interacts with the outer surface of the film, and a spacer (backbone) chain group that connects the head and tail groups resulting in a coating. Interactions between spacer groups of different molecules, such as van der Waals forces and/or hydrogen bonding, hasten SAM film formation and contribute to its stability. In this dissertation, SAM and thin films have been formed onto copper and aluminum oxide surfaces by reaction with 1H,1H,2H,2H-perfluorodecyldimethylchlorosilane (PFMS), 1H,1H,2H,2H-perfluorodecyltrichlorosilane (PFTS), 1H,1H,2H,2H-perfluorodecylphosphonic acid (PFDP), octylphosphonic acid (OP), decylphosphonic acid (DP), and octadecylphosphonic acid (ODP). The properties and stability of the films were investigated employing complementary surface analysis techniques: X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), friction force microscopy (FFM), a derivative of AFM, contact angle measurements (CAMs), and Fourier transform infrared reflection/absorption spectroscopy (FT-IRRAS). The perfluoroalkylsilane SAM on Cu is found to be extremely hydrophobic typically having sessile drop static contact angles of more than 130° for pure water and a surface energy of 14 mJ/m2 (mN/m). FFM showed a significant reduction in the adhesive force and friction coefficient of PFMS modified Cu (PFMS/Cu) compared to unmodified Cu. Treatment by exposure to harsh conditions showed that PFMS/Cu SAM can withstand boiling nitric acid (pH=1.8), boiling water, and warm sodium hydroxide (pH=12, 60 °C) solutions for at least 30 minutes. Furthermore, no SAM degradation was observed when PFMS/Cu was exposed to warm nitric acid solution for up to 70 min at 60 °C or 50 min at 80 °C. XPS and FT-IRRAS data reveal a coordination of the PFMS silicon (Si) atom with a cuprate (CuO) molecule present on the oxidized copper substrate. The data give good evidence that the stability of the SAM film on the PFMS modified oxidized Cu surface is largely due to the formation of a siloxy-copper (-Si-O-Cu-) bond via a condensation reaction between silanol (-Si-OH) and copper hydroxide (CuOH). For a PFTS modified Cu surface (PFTS/Cu), the sessile drop static contact angle of pure water has been measured to be more than 125° and the surface energy to be typically less than 16 mJ/m2. Stability tests show that the PFTS/Cu film can survive in boiling pure water for one hour, boiling nitric acid (pH 1.5 or 1.8) for 30 minutes, sodium hydroxide solution (pH 12, 70 °C) for 30 minutes, and autoclave conditions (steam at 134 °C and 3 atmospheres) for 15 minutes. The more commonly used self-assembled monolayer (SAM) modifications of Cu surfaces, e.g. thiol compounds, are significantly less stable than PFTS/Cu. Extremely hydrophobic (low surface energy) and stable PFMS/Cu SAMs and PFTS/Cu films could be useful as corrosion inhibitors in micro/nanoelectronic devices and/or as promoters for anti-wetting, low adhesion surfaces or drop-wise condensation on heat exchange surfaces. XPS analysis confirmed the presence of perfluorinated and non-perfluorinated alkylphosphonate molecules on the PFDP, DP, and ODP SAMs deposited at the aluminum oxide coated silicon (Al/Si) surfaces. The sessile drop static contact angle of pure water on PFDP SAMs was typically more than 130° and on DP and ODP typically more than 125° indicating that the phosphonic acid SAMs reacted with Al samples were very hydrophobic. The surface roughness for PFDP/Al, DP/Al, ODP/Al, and bare Al was approximately 35 nm, as determined by AFM. The surface energy for PFDP/Al was determined to be approximately 11 mJ/m2 by the Zisman plot method compared to 21 mJ/m2 and 20 mJ/m2 for DP/Al and ODP/Al, respectively. PFDP/Al gave the lowest adhesion and friction force while bare Al gave the highest. The adhesion and friction forces for ODP/Al and DP/Al SAMs were in between. ODP, DP, and OP SAMs have been studied in detail on relatively flat aluminum oxide surfaces. The rms surface roughness for ODP/Al, DP/Al, OP/Al, and bare Al was less than 15 nm, as determined by AFM. The sessile drop static contact angle of pure water on ODP/Al and DP/Al was typically more than 115° and on OP/Al typically less than 105°. The surface energy for ODP/Al and DP/Al was determined to be approximately 21 mJ/m2 and 22 mJ/m2, respectively, compared to 26 mJ/m2 for OP/Al. ODP/Al and OP/Al were studied by FFM to better understand their micro-/nano-tribological properties. ODP/Al gave the lowest coefficient of friction values while bare Al gave the highest. The adhesion forces for ODP/Al and OP/Al were comparable. The chemical stability of ODP/Al, PFDP/Al, DP/Al, OP/Al, and PFMS/Al SAMs has been inspected by exposure to warm nitric acid (pH 1.8, 30 min, 60-95 °C). The XPS data and stability against harsh chemical conditions indicate that a type of bond forms between a phosphonic acid (PA) or silane molecule and the oxidized Al surface. Stability tests using warm nitric acid (pH 1.8, 30 min, 60-95 °C) show ODP/Al SAMs to be most stable followed by PFDP/Al, DP/Al, PFMS/Al, and OP/Al SAMs. For PFTS/Al, stability tests demonstrate that modified aluminum is able to survive exposure to warm nitric acid (pH = 1.8, 60 °C, 30 min) indicating some degree of robustness. Hydrophobic, low adhesion, and robust aluminum surfaces have useful applications for micro/nano-electromechanical systems (MEMS/NEMS), such as digital micro-mirror devices (DMDs). These studies are expected to aid in the design and selection of proper lubricants for MEMS/NEMS.

EPFL2007