Concept

Nitrure de silicium

Publications associées (348)

First results on the SPS beam collimation with bent crystals

Experiments were performed at the CERN SPS with 120 GeV/c stored proton beams to assess the possibility of beam halo collimation assisted by bent crystals. A bent crystal was used to deflect horizontally by an angle of about 170 mu rad the beam halo proton ...

Elsevier2010

Reusable Localized Surface Plasmon Sensors Based on Ultrastable Nanostructures

Noelia Laura Bocchio

Nanoparticle arrays created by nanosphere lithography are widely used in sensing applications since their localized surface plasmon resonances are extremely sensitive to changes in the local dielectric environment. A major drawback for any biologically ori ...

Wiley-Blackwell2010

Structural, optical, and electrical properties of silicon nanowires for solar cells

Christophe Ballif, Johann Michler, Stefaan De Wolf

We investigated Si nanowires (SiNWs) fabricated by wet etching and chemical vapor deposition (CVD), and core-shell structures, formed by depositing silicon layers around the SiNWs, with respect to their crystallinity, the doping level, and the influence of ...

2010

Morphology of polymer/clay latex particles synthesized by miniemulsion polymerization: Modeling and experimental results

John Christopher Plummer

BA/MMA (90:10 wt.-%) were copolymerized in the presence of two different organomodified clays (C30B and CMA16) and 1.6-2.6wbm.-% surfactants. The effect of the compatibility of the organoclay in the monomer mixture on the morphology of hybrid polymer/clay ...

Wiley-Blackwell2010

Mixed-phase p-type silicon oxide containing silicon nanocrystals and its role in thin-film silicon solar cells

Christophe Ballif, Duncan Thomas Lindsay Alexander, Matthieu Despeisse, Mathieu Gérard Boccard, Grégory Bugnon, Peter Cuony, Michael Marending

Lower absorption, lower refractive index, and tunable resistance are three advantages of amorphous silicon oxide containing nanocrystalline silicon grains nc-SiOx compared to microcrystalline silicon c-Si, when used as a p-type layer in c-Si thin-film sola ...

American Institute of Physics2010

Carrier transport and sensitivity issues in heterojunction with intrinsic thin layer solar cells on N-type crystalline silicon: A computer simulation study

Christophe Ballif, Anwitaman Datta, Père Roca i Cabarrocas

Heterojunction with intrinsic thin layer or HIT solar cells are considered favorable for large-scale manufacturing of solar modules, as they combine the high efficiency of crystalline silicon (c-Si) solar cells, with the low cost of amorphous silicon techn ...

American Institute of Physics2010

Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography

Jeffrey Alan Hubbell, Harry Heinzelmann, Raphaël Pugin, Ana Maria Popa

Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus ...

2009

102-GHz AlInN/GaN HEMTs on Silicon With 2.5-W/mm Output Power at 10 GHz

Nicolas Grandjean, Jean-François Carlin, Eric Feltin, Marcus Gonschorek

Grown on a (111) high-resistivity silicon substrate, 0.1-mu m gate AlInN/GaN high-electron mobility transistors (HEMTs) achieve a maximum current density of 1.3 A/mm, an extrinsic transconductance of 330 mS/mm, and a peak current gain cutoff frequency as h ...

2009

Stimuli-responsive nanostructured surfaces

Ana Maria Popa

The coupling of stimuli-responsive macromolecules to nanostructured surfaces opens the perspective for the fabrication and integration of "smart" micro- and nano-electro-mechanical systems (MEMS&NEMS) in which the smallest motile unit is the polymeric chai ...

EPFL2009

High vacuum chemical vapor deposition (HV-CVD) of alumina thin films

Xavier Multone

We analyzed along this work the feasibility to produce high quality alumina thin films by High Vacuum Chemical Vapor Deposition (HV-CVD). We study the influence of various parameters on the growth process and on the film quality, such as substrate temperat ...

EPFL2009

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