Carrier transport and sensitivity issues in heterojunction with intrinsic thin layer solar cells on N-type crystalline silicon: A computer simulation study

Heterojunction with intrinsic thin layer or HIT solar cells are considered favorable for large-scale manufacturing of solar modules, as they combine the high efficiency of crystalline silicon (c-Si) solar cells, with the low cost of amorphous silicon technology. In this article, based on experimental data published by Sanyo, we simulate the performance of a series of HIT cells on N-type crystalline silicon substrates with hydrogenated amorphous silicon (a-Si:H) emitter layers, to gain insight into carrier transport and the general functioning of these devices. Both single and double HIT structures are modeled, beginning with the initial Sanyo cells having low open circuit voltages but high fill factors, right up to double HIT cells exhibiting record values for both parameters. The one-dimensional numerical modeling program "Amorphous Semiconductor Device Modeling Program" has been used for this purpose. We show that the simulations can correctly reproduce the electrical characteristics and temperature dependence for a set of devices with varying I-layer thickness. Under standard AM1.5 illumination, we show that the transport is dominated by the diffusion mechanism, similar to conventional P/N homojunction solar cells, and tunneling is not required to describe the performance of state-of-the art devices. Also modeling has been used to study the sensitivity of N-c-Si HIT solar cell performance to various parameters. We find that the solar cell output is particularly sensitive to the defect states on the surface of the c-Si wafer facing the emitter, to the indium tin oxide/P-a-Si:H front contact barrier height and to the band gap and activation energy of the P-a-Si:H emitter, while the I-a-Si:H layer is necessary to achieve both high Voc and fill factor, as it passivates the defects on the surface of the c-Si wafer. Finally, we describe in detail for most parameters how they affect current transport and cell properties.

Contact Design for Silicon Heterojunction Solar Cells

Luca Massimiliano Antognini

Today more than ever the world needs clean energy sources and thus a fast deployment and scaling up of the photovoltaic industry. In this context improving solar cell efficiency plays a major role. In order to achieve the maximum single junction efficiency for this material, technologies featuring carrier selective passivating contacts are foreseen to be the next successors of actual industrial cells. Among them, the silicon heterojunction (SHJ) solar cell is a promising technology which demonstrated efficiencies up to 26.7%. Its main specificity consists in the use of intrinsic and doped amorphous silicon (a-Si:H) to provide surface passivation and carrier selectivity to the c-Si, which allows to reach very high operating voltages in comparison to other c-Si based technology. The major drawbacks of SHJ solar cell is the large parasitic absorption occurring in those layers. To address this challenge, a strong focus on alternative non-silicon based thin films with wider band gap has built up in the literature. A first part of this thesis focuses on reviewing the fundamental process behind carrier selectivity and discuss the ability of different models from the literature to draw informations directly from the peculiar shapes of IV curves commonly observed in the solar cells featuring newly developed materials. We first discuss the simple four ideal diodes model of Roe et al to explain the occurrence of S-shapes depending on the contact quality. We discuss from a theoretical point of view how to improve the model by modifying the ideal diodes by other circuit elements as well as adding bulk recombinations. We test the theory experimentally and identified modifications that should be incorporated in the model.In a second part of the thesis, we explore the development of doped nano-crystalline silicon (nc-Si) layers to replace classical amorphous silicon layers. We investigate the influence of TMB and BF3 as dopant sources on the transparency and contact properties of nc-Si:H(p) layers as well as their integration in solar cells. We expose the roles of both gas to modify the crystallinity of the layer and find different optimum for both of them to lead high efficiencies, illustrated by a certified 23.9%-efficient solar cell. We report also on further optimization steps of this front junction architecture resulting in certified efficiency of 24.44%.We explore next the n-type nc-Si layers for application as window layer. In particular, we perform thickness and doping series to unravel the layer properties along its growth direction. In order to improve the low doping of the nucleation zone of nc-Si:H(n) at the i/n interface, a thin a-Si:H(n) buffer layer is introduced and shown to improve the passivation, selectivity and contact resistivity. Finally, we also report on the beneficial effect of an additional SiOx capping layer which improves both the reflection properties as well as all contact properties, broadening the optimal parameter window. The absorption loss in the front silicon layers remains however the highest share of losses, and therefore we explore theoretically the opportunity of using thinner front side layers or using thin TCO / silicon nitride bilayers to reduce the absorption losses. We finish the discussion by presenting an optimization roadmap, showing a possibility for double-side contacted SHJ cells to reach efficiencies above 26% without requiring any patterning or localization step.

EPFL2022

Window Layers for Silicon Heterojunction Solar Cells

Johannes Peter Seif

Currently, crystalline silicon (c-Si) wafer-based solar cells dominate the photovoltaic market (80-90%). In this thesis we concentrate on silicon heterojunction (SHJ) solar cells that--in contrast to diffused homojunction cells--rely on the application of amorphous silicon (a-Si:H) thin films. Unlike standard homojunction devices, which are typically limited by their highly recombination-active semiconductor-to-metal contacts, SHJ devices exhibit excellent surface passivation enabled by intrinsic and doped a-Si:H films. These a-Si:H layers, however, entail drawbacks for optical performance and carrier transport, two topics that will be addressed in this work. To this end we investigate non-traditional materials for SHJ devices, with the goal of replacing the a-Si:H or the transparent electrodes. These materials include microcrystalline silicon (uc-Si:H) and organic semiconductors for contact formation; amorphous silicon suboxides (a-SiOx:H) for surface passivation; and transparent electrodes applied by atomic layer deposition (ALD) as protective layers against subsequent processing steps. Along with the optical and electrical properties of these materials, we study the impact on device performance associated with their deposition. For this we test the devices under standard testing conditions (25 °C) and at elevated temperatures closer to those encountered in the field. For the investigations on uc-Si:H layers, we vary process parameters (including temperature, pressure, power, excitation frequency and hydrogen dilution) as well as pre-treatments, gas variations and nucleation layers. We assess the suitability of these approaches for SHJ solar cells and apply selected measures in devices. Thereby we demonstrate a gain in short-circuit current density in the range of 0.5-1 mA.cm-2 and good fill factor values of up to 79.2% using either n- and p-type uc-Si:H layers. Furthermore, with the goal of reducing optical losses, we test wide-bandgap a-SiOx:H layers for passivation. In terms of current gain without negative side effects on transport, we argue that these layers are best applied to the electron-collecting contact--put at the front of the device--as their application to the hole-collecting contact introduces a transport barrier for holes. This barrier deteriorates the device performance at 25 °C, but shows a beneficial effect on the temperature coefficient of the device, yielding coefficients as low as -0.1%/°C. In some cases--compared to standard devices--devices with a-SiOx:H layers exhibit superior performance at elevated temperatures, which can be of interest in warmer climates. In parallel to these main topic we also study aluminium-doped zinc oxide (ZnO:Al) layers deposited by ALD as a protective layer against sputter-induced damage and organic semiconductors as transparent electrodes for the hole-collecting contact. In both cases we observe a gain in terms of surface passivation, which indicates that these materials may be beneficial for the contact formation in future device structures. In addition to these material-related investigations, we unravel the temperature-dependence of each individual cell parameter and present a brief comparison of state-of-the-art technologies and their respective temperature dependence.

EPFL2015

Increasing the efficiency of silicon heterojunction solar cells and modules by light soaking

Christophe Ballif, Stefaan De Wolf, Antoine Descoeudres, Matthieu Despeisse, Franz-Josef Haug, Eiji Kobayashi, Jacques Levrat

Silicon heterojunction solar cells use crystalline silicon (c-Si) wafers as optical absorbers and employ bilayers of doped/intrinsic hydrogenated amorphous silicon (a-Si:H) to form passivating contacts. Recently, we demonstrated that such solar cells increase their operating voltages and thus their conversion efficiencies during light exposure. We found that this performance increase is due to improved passivation of the a-Si:H/c-Si interface and is induced by injected charge carriers (either by light soaking or forward-voltage biasing of the device). Here, we discuss this counterintuitive behavior and establish that: (i) the performance increase is observed in solar cells as well as modules; (ii) this phenomenon requires the presence of doped a-Si:H films, but is independent from whether light is incident from the a-Si:H(p) or the a-Si:H(n) side; (iii) UV and blue photons do not play a role in this effect; (iv) the performance increase can be observed under illumination intensities as low as 20 W m(-1) (0.02-sun) and appears to be almost identical in strength when under 1-sun (1000 W m(-1)); (v) the underlying physical mechanism likely differs from annealing-induced surface passivation.