Publications associées à Techniques de l'estampe

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Cristina Martin Olmos, Oscar Vazquez Mena, Katrin Sidler Arnet

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Fabrication of soft gold microelectrode arrays as probes for scanning electrochemical microscopy

Hubert Girault, Andreas Stephan Lesch, Fernando Cortes Salazar, Dmitry Momotenko, Gunther Wittstock

Soft linear gold microelectrode arrays for high throughput scanning electrochemical microscopy (SECM) imaging were fabricated using the Aerosol Jet (R) printing technology. Nanoparticulate gold ink was printed on polyimide Kapton HN (R) thin films. After s ...

Elsevier2012

Directly fabricated multi-scale microlens arrays on a hydrophobic flat surface by a simple ink-jet printing technique

Jürgen Brugger, Joo Yeon Kim

A shape-tunable approach is demonstrated for the fabrication of multi-scale polymer microlenses ([small mu ]-lenses) and microlens arrays (MLAs) using an ink-jet printing (IJP) technique. Also, the influence of the surface wetting conditions on the geometr ...

Royal Society of Chemistry2012

Hybrid polymer microlens arrays with high numerical apertures fabricated using simple ink-jet printing technique

Jürgen Brugger, Edoardo Charbon, Vahid Fakhfouri, Dmitri Boiko, Joo Yeon Kim, Nils Benedict Brauer

Microlens arrays fabricated by a direct ink-jet printing of UV-curable hybrid polymer are reported. A periodic pattern of polymer drops was ink-jet printed on the surface-treated glass substrate and cured in the UV-light. Using this simple technique, we de ...

2011

Advances in Nanostenciling: resistless nanopatterning enables new applications

Jürgen Brugger, Andreea Veronica Savu

This paper presents the state-of-the-art of nanostencil as a direct and local patterning method. Stencil lithography is a high-resolution shadow mask technique that allows structuring surfaces without using the harsh process steps typically associated with ...

2011

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet

Abstract— The reliable and reproducible fabrication of nanostructures by stencil lithography faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nano ...

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Three-level stencil alignment fabrication of a high-k gate stack organic thin film transistor

Jürgen Brugger, Mihai Adrian Ionescu, Andreea Veronica Savu, Dimitrios Tsamados, Katrin Sidler Arnet, Nenad Cvetkovic

In this work a high-k double-gate pentacene field-effect transistor architecture is presented. The devices are fabricated on a flexible polyimide substrate by three aligned levels of stencil lithography combined with standard photolithography. ALD-deposite ...

Elsevier2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

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Techniques de l'estampe

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Heated membranes for stencil lithography application

Fabrication of soft gold microelectrode arrays as probes for scanning electrochemical microscopy

Directly fabricated multi-scale microlens arrays on a hydrophobic flat surface by a simple ink-jet printing technique

Hybrid polymer microlens arrays with high numerical apertures fabricated using simple ink-jet printing technique

Advances in Nanostenciling: resistless nanopatterning enables new applications

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Robust PECVD SiC membrane made for stencil lithography

Three-level stencil alignment fabrication of a high-k gate stack organic thin film transistor

Robust PECVD SiC membrane made for stencil lithography

Graph Chatbot

Chattez avec Graph Search

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Heated membranes for stencil lithography application

Fabrication of soft gold microelectrode arrays as probes for scanning electrochemical microscopy

Advances in Nanostenciling: resistless nanopatterning enables new applications

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Directly fabricated multi-scale microlens arrays on a hydrophobic flat surface by a simple ink-jet printing technique

Hybrid polymer microlens arrays with high numerical apertures fabricated using simple ink-jet printing technique

Robust PECVD SiC membrane made for stencil lithography

Three-level stencil alignment fabrication of a high-k gate stack organic thin film transistor

Robust PECVD SiC membrane made for stencil lithography