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Publications associées (98)

Stencil lithography

Marc Antonius Friedrich van den Boogaart

This work describes the advancements made in micro and nano patterning via stencil lithography. Stencil lithography is a resist-less and direct pattern technique where a controlled amount of material is deposited through apertures on to a substrate in a va ...

EPFL2006

EVAPORATION THROUGH SHADOW MASKS ON UNCONVENTIONAL SUBSTRATES

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Chantal Imboden

While standard photolithography methods have proven themselves in semiconductor applications, they have fundamental limitations when considered for the fabrication of advanced micro/nanosystems (MEMS/NEMS). MEMS and NEMS often use “soft” materials such as ...

2005

ASSESSMENT OF MICROSTENCILING TECHNIQUE FOR LOW-COST PRODUCTION OF MICROELECTRODES

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano, Helmut Knapp

Shadow mask evaporation is a powerful technique which enables us to make micro- or nano-structures on substrates which are not feasible for conventional photolithography processes, such as plastics, pre-structured substrate, biologically/chemically modifie ...

2005

Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Patrik Willi Hoffmann, Tristan Bret, Xavier Multone

A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chro ...

FEI CO (FEIF-Non-standard)2005

Pattern recovery by dry etching of gap-induced blurring in nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Nanostencil lithography is a flexible, rapid and resistless patterning method based on a high-resolution shadow mask. It allows for a wide choice of materials and surfaces to be structured and on the contrary to deep-ultraviolet (DUV), x-ray, electron beam ...

2005

Characterisation and applications of stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Nao Takano

Increased flexibility of patterning methods is important for the engineering of multimaterial and multifunctional nano/micro-electro-mechanical systems (NEMS/MEMS), such as polymer-based electronic and sensor devices, 3D microfluidic systems, and bio-analy ...

2005

Ties between microsystem technology and nano-engineering

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Schahrazede-Lila Mouaziz, Johannes Steen

The continuous improvements in conventional lithography methods for integrated circuit hardware allow further device shrinkage deep into the sub-micron dimensions. Two major drawbacks of these high-end patterning methods based on photoresist technologies a ...

2004

MEMS based nanopatterning

Jürgen Brugger, Christian Santschi, Marc Antonius Friedrich van den Boogaart, Nao Takano

Sub-micron lithography processes are continuously optimized for semiconductor products where the enormous market potential justifies investment in advanced methods and extremely sophisticated equipment. Due to the extreme process costs and due to the limit ...

2004

Enhancement of the nanostencil method and its applications

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Increased flexibility in patterning becomes important for the engineering of advanced nano/micro-electro-mechanical systems (NEMS/MEMS). Surfaces to be structured are either mechanically unstable and/or (bio-) chemically functionalized, such as ultra-thin ...

2004

Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes a ...

2003

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