Concept

Gravure ionique réactive

Publications associées (254)

Fabrication and characterisation of ultrasensitive monocrystalline silicon cantilevers with integrated magnetic tips

During this project, ultrasensitive cantilevers designed for nuclear magnetic resonance applications were fabricated and characterised. The cantilevers are 500, 340 or 200 μm long, 10 or 20 μm wide and 500 or 340 nm thick and integrate a thin film of cobal ...

2006

Can InAlN/GaN be an alternative to high power/high temperature AlGaN/GaN devices ?

Jean-François Carlin, Eric Feltin, Marcel Py, Marcus Gonschorek, Daniel Grandjean

The performance of novel AlInN/GaN HEMTs for high power / high temperature applications is discussed. With 0.25 mu m gate length the highest maximum output current density of more than 2 A/mm at room temperature and more than 3 A/mm at 77 K have been obtai ...

IEEE2006

SUB-MICRON SCALE PATTERN TRANSFER INTO POLYMERS BY THERMAL IMPRINT LITHOGRAPHY

Jürgen Brugger, Christian Santschi, Thomas Kiefer, Nao Takano

Nanoimprint lithography (NIL) is an emerging patterning technology which shows the capability of fabricating nanostructures on a large scale. It is therefore interesting for low-cost NEMS manufacturing. As schematically shown, a stamp made of single crysta ...

2006

Polymer-based cantilevers with integrated electrodes

Jürgen Brugger, Giovanni Boero, Radivoje Popovic, Schahrazede-Lila Mouaziz

An innovative release method of polymer cantilevers with embedded integrated metal electrodes is presented. The fabrication is based on the lithographic patterning of the electrode layout on a wafer surface, covered by two layers of SU-8 polymer: a 10-um-t ...

Institute of Electrical and Electronics Engineers2006

Directed assembling of gold nanoparticles using Van der Waals interactions

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

In the last past years, many promising applications of nanoparticles in quantum electronics such as nanocrystal memories, chemical sensors or nanodevices based on single electron tunneling and Coulomb blockade effects have attracted much attention. Nanopar ...

2006

Stenci Lithography: Status and Prospectives

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Nao Takano

Stencil lithography is a surface patterning technique that relies on the local deposition of material through miniaturized shadow mask membranes. This method has been used since many years in various implementations for the formation of patterns (mainly st ...

2006

STAMP FABRICATION FOR NANOIMPRINT LITHOGRAPHY BY PATTERN DEFINITION WITH STENCIL LITHOGRAPHY

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano

A silicon stamp for nanoimprint lithography (NIL) was fabricated from the patterns defined by stencil lithography. Since stencil lithography has a capability of producing sub-micron patterns in a single process, we were able to make a silicon stamp with a ...

2006

The effect of photonic crystal structure on the nonlinear optical anisotropy of the birefringent porous silicon

Anisotropic photonic crystal structures consisting of birefringent porous silicon layers with alternating porosity were fabricated. The in-plane birefringence formed as a result of anisotropic etching in Si(110) results in unique multilayered structures wi ...

2006

Generic technological platform for microfabricationg silicon nitride micro-and nanopipette arrays

Nico de Rooij

In this paper, the design and the characterization of batch fabricated SixNy micropipette arrays with diameters ranging from 6 νm down to 250 nm are described. The process used to fabricate the micromachined pipettes includes a deep reactive ion etching st ...

2005

Fabrication of AFM Probes: Tip, Cantilever and Chip micromachining by DRIE

Luis Guillermo Villanueva Torrijo

We report on the fabrication of atomic force microscopy (AFM) probes using a novel technology that performs every machining step by means of one single deep reactive ion etching (DRIE) equipment. Specific etching conditions are optimized in order to define ...

2005

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