Concept

Gravure ionique réactive

Publications associées (254)

Flexible microchannels with integrated nanoporous membranes for filtration and separation of molecules and particles

Philippe Renaud, Arnaud Bertsch, Stefan Metz

This paper reports on the technology development and characterization of polyimide-based, microfluidic channels with integrated nanoporous membranes. A layer transfer and lamination technique is used to fabricate flexible microchannels from spin-on polyimi ...

2002

Performance of an Integrated Microoptical System for Fluorescence Detection in Microfluidic Systems

Nico de Rooij, Hans Peter Herzig, René Dändliker

This article presents a new integrated microfluidic/microoptic device designed for basic biochemical analysis. The microfluidic network is Wet-etched in a Borofloat 33 (Pyrex) glass wafer and sealed by means of a second wafer. Unlike other similar microflu ...

2002

Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide

René Salathé, Patrik Willi Hoffmann, Cyrille Hibert

We report, to our knowledge, the first active channel waveguide in Ti:sapphire. We have created [similar to] 1.4-μm high ribs in a [similar to] 10-μm thick Ti:sapphire planar waveguide by reactive ion etching. Following excitation by an Ar-ion laser, the r ...

2002

Raman scattering in GaN pillar arrays

Nicolas Grandjean, Yixing Chen

We present a detailed study of GaN pillar arrays by atomic force microscopy (AFM), Raman spectroscopy, and photoluminescence (PL) spectroscopy. AFM is used to characterize the shape of the GaN pillars and revealed a large roughness of etched pillar surface ...

2002

DEEP ANISOTROPIC ETCHING OF SILICON USING LOW PRESSURE HIGH DENSITY PLASMA. PRESENTATION OF COMPLEMENTARY TECHNIQUES AND THEIR APPLICATIONS IN MICROTECHNOLOGY.

Cyrille Hibert, Philippe Flückiger

The flexibility of the new available Inductively Coupled Plasma (ICP) reactors provides a lot of possibilities for process development in dry etching field. Deep anisotropic etching of silicon is now possible under control (etch rate, profiles, uniformity) ...

2001

Soft and rigid two-level microfluidic networks for patterning surfaces

Nico de Rooij

We describe the microfabrication and use of elastomeric and rigid two-level microfluidic networks (μFNs), made of poly(dimethylsiloxane) (PDMS) or Si, for patterning surfaces. The first level corresponds to microchannels and the second to via holes through ...

2001

Low numerical aperture refractive microlenses in fused silica

Hans Peter Herzig

Fused silica microlenses with low numerical apertures (NAs) were fabricated. The original photoresist element was realized by the melting resist technology and was transferred into fused silica by reactive ion etching. Low selectivity etching was applied t ...

2001

Fabrication of multilayer systems combining microfluidic and micro-optical elements for fluorescence detection

Nico de Rooij, Hans Peter Herzig, René Dändliker

This paper presents the fabrication of a microchemical chip for the detection of fluorescence species in microfluidics. The microfluidic network is wet-etched in a Borofloat 33 (Pyrex) glass wafer and sealed by means of a second wafer. Unlike other similar ...

2001

Direct integration of micromachined pipettes in a flow channel for single DNA molecule study by optical tweezers

Jürgen Brugger

We have developed a micromachined flow cell consisting of a flow channel integrated with micropipettes. The flow cell is used in combination with an optical trap setup (optical tweezers) to study mechanical and structural properties of -DNA molecules. The ...

2001

A self-assembled monolayer-assisted surface microfabrication and release technique

Jürgen Brugger

This paper describes a method of thin film and MEMS processing which uses self-assembled monolayers as ultra-thin organic surface coating to enable a simple removal of microfabricated devices off the surface without wet chemical etching. A 1.5-nm thick sel ...

2001

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