Concept

Scanning probe lithography

Publications associées (109)

Electrically conducting probes with full tungsten cantilever and tip for scanning probe applications

Jürgen Brugger, Andrzej Kulik, Giovanni Boero, Florian Calame, Johannes Steen

We have developed a new hybrid AFM probe combining an SU-8 polymer body with a full tungsten cantilever having a nanometric tip. The fabrication is based on surface micromachining a silicon wafer, where tungsten is sputter deposited in oxidation sharpened ...

2006

Selective etching of n-InP(1 0 0) triggered at surface dislocations induced by nanoscratching

Christophe Ballif, Johann Michler

This work investigates selective dissolution of n-InP(1 0 0) triggered by surface defects. Nanometer size grooves were produced by sensitizing an InP surface with a mechanical contact patterning technique, i.e. nanoscratching at low loading forces at the t ...

2006

Chemical nanopatterns via Nanoimprint Lithography for simultaneous control over azimuthal and polar alignment of liquid crystals

Toralf Scharf

The use of chemical nanopatterns through nanoimprint lithography ato align a nematic liquid crystal (LC) in LC cells was described. It was found that the ratio of areas with different surface-aligning helped in the polar orientation of LC, while the azimut ...

2005

Liquid Crystal Alignment Chemical Nanopatterns : Control over Azimuthal and Polar Alignment

Toralf Scharf

We discuss alignment properties of nematic liquid crystals on surfaces that contain homeotropic and planar alignment areas on the same surface substrate. The basic idea is to locally pattern homeotropic agents (silane) on surfaces that usually lead to plan ...

2005

Advancing towards well-controlled full-wafer nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano

The endeavour to develop nanodevices demands for patterning methods in the nanoscale. To bring nanodevices to the market, there is a need for fast, low-cost replication nanopatterning methods. In addition, an increased flexibility of the nanopatterning met ...

2005

NANOSTENCIL-BASED LITHOGRAPHY FOR SILICON NANOWIRES FABRICATION

Jürgen Brugger, Christian Santschi, Marc Antonius Friedrich van den Boogaart

We propose a novel lithography method based on local deposition through miniature shadow-masks (nanostencils) for the fabrication of silicon based nanoelectronics devices. We demonstrate the fabrication of nanowires with a CMOS compatible stencil based lit ...

2005

Microscopic four-point probe (u4PP) based on SU-8 cantilevers

Jürgen Brugger, Giovanni Boero, Schahrazede-Lila Mouaziz, Stephan Keller

Four-point probes (4PPs) are used for the resistivity measurement of thin metal or semiconductor films. There is an interest in miniaturization of 4PPs to obtain higher surface sensitivity, increased spatial resolution and less damage to the sample. Severa ...

2005

Ferroelectric gates with rewritable domain nanopatterns for modulation of transport properties in GaN/AlGaN heterostructures

Nava Setter, Jean-François Carlin, Igor Stolichnov, Enrico Colla, Lisa Malin

The concept of field-effect transistor with ferroelectric gate in combination with the advanced technique of direct domain writing is applied for modulation of transport properties of 2D electron gas located close to the interface in a GaN/AlGaN heterostru ...

AIP2005

Nanostencil-based lithography for silicon nanowires fabrication

Jürgen Brugger, Christian Santschi

We propose a novel lithography method based on local deposition through miniature shadow-masks (nanostencils) for the fabrication of silicon based nanoelectronics devices. The method allows patterning of sub 100nm scale metal structures in a reproducible w ...

2005

On the coupling and transmission of transverse and longitudinal fields into fully metal-coated optical nano-probes

Hans Peter Herzig, Toralf Scharf, Laure Aeschimann

Fully-metal-coated near-field optical probes, based on a cantilever design, have been studied theoretically and experimentally. Numerical simulations prove that these structures allow non-zero modal emission of the electromagnetic field trough a 60 nm thic ...

2005

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