Publications associées à Dépôt chimique en phase vapeur assisté par plasma

Solid on liquid deposition, a review of technological solutions

Roland Andreas Bitterli, Laure Jeandupeux

Solid-on-liquid deposition (SOLID) techniques are of great interest to the MEMS and NEMS (Micro- and Nano Electro Mechanical Systems) community because of potential applications in biomedical engineering, on-chip liquid trapping, tunable micro-lenses, and ...

Elsevier2015

Characterization and Optimization of Silicon Nitride Thin Films

Tom Larsen, Hugo Jérémie Roland Musard

Ten runs of silicon nitride LPCVD (Low Pressure Chemical Vapor Deposition) depositions were performed with a different recipe for each run. The goal of this work was to examine properties of silicon nitride and their variation with regards to the depositio ...

2015

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a very promising material for the integration of optical communication into electronic integrated circuits. For a successful integration into CMOS compatible technology, a growth process has to be found which allows forming crystalline B ...

Wiley-VCH Verlag Berlin2015

The Biocompatibility and Anti-Biofouling Properties of Magnetic Core-Shell Fe@C NWs/AAO Nanocomposites

Mahmut Selman Sakar

Soft-magnetic core–multishell Fe@C NWs–AAO nanocomposites were synthesized using anodization, electrodeposition and low-pressure chemical vapour deposition (CVD) at 900 °C. High chemical and mechanical stability is achieved by the conversion from amorphous ...

Royal Society of Chemistry2015

APCVD of dual layer transparent conductive oxides for photovoltaic applications

Benoît Florent Paul Delaup, Monica Morales Masis

We report the atmospheric pressure chemical vapour deposition (APCVD) of a dual layer transparent conductive oxide (TCO). This combines a fluorine doped tin oxide (FTO) base layer with a fluorine doped zinc oxide (FZO) top layer, where we seek to utilise t ...

Elsevier2015

Nanocrystalline Low-Refractive Magnesium Fluoride Films Deposited by Reactive Magnetron Sputtering: Optical and Structural Properties

Jean-Louis Scartezzini, Paul Muralt, Silviu Cosmin Sandu, Stefan Mertin

In this work, we study MgF2 thin-film synthesis by reactive pulsed DC magnetron sputtering from a metallic magnesium target in a gas mixture of argon, oxygen, and carbon tetrafluoride (CF4). Nanocrystalline films on silicon and glass substrates with excell ...

Wiley-Blackwell2015

Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

A key factor in engineering integrated optical devices such as electro-optic switches or waveguides is the patterning of thin films into specific geometries. In particular for functional oxides, etching processes are usually developed to a much lower exten ...

Amer Chemical Soc2015

Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Understanding the surface kinetics of precursor decomposition during thin film formation represents a key aspect in the understanding and engineering of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The determination of activ ...

American Chemical Society2015

Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke, Evgeniy Ponomarev

The combinatorial characterization of the growth kinetics in chemical vapor deposition processes is challenging because precise information about the local precursor flow is usually difficult to access. In consequence, combinatorial chemical vapor depositi ...

ACS Publications2015

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Dépôt chimique en phase vapeur assisté par plasma

Solid on liquid deposition, a review of technological solutions

Characterization and Optimization of Silicon Nitride Thin Films

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

The Biocompatibility and Anti-Biofouling Properties of Magnetic Core-Shell Fe@C NWs/AAO Nanocomposites

APCVD of dual layer transparent conductive oxides for photovoltaic applications

Nanocrystalline Low-Refractive Magnesium Fluoride Films Deposited by Reactive Magnetron Sputtering: Optical and Structural Properties

Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition

Quantification of low molecular weight drugs

Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition

Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide

Graph Chatbot

Chattez avec Graph Search

The Biocompatibility and Anti-Biofouling Properties of Magnetic Core-Shell Fe@C NWs/AAO Nanocomposites

Solid on liquid deposition, a review of technological solutions

APCVD of dual layer transparent conductive oxides for photovoltaic applications

Characterization and Optimization of Silicon Nitride Thin Films

Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide

Nanocrystalline Low-Refractive Magnesium Fluoride Films Deposited by Reactive Magnetron Sputtering: Optical and Structural Properties

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition

Quantification of low molecular weight drugs

Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition