Marc Antonius Friedrich van den Boogaart

Cette personne n’est plus à l’EPFL

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Publications associées (37)

Synthesis of localized 2D-layers of silicon nanoparticles embedded in a SiO2 layer by a stencil-masked ultra-low energy ion implantation process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We propose an original approach called “stencil-masked ion implantation process” to perform a spatially localized synthesis of a limited number of Si nanoparticles (nps) within a thin SiO2 layer. This process consists in implanting silicon ions at ultra-lo ...

Wiley2007

Predicting mask distortion, clogging and pattern transfer for stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

One of the ultimate tasks for stencil lithography is the ability to fabricate arrays of structures with controlled dimensions on the nanometer scale precisely positioned on a suitable surface. The race to shrink feature sizes requires the limits of convent ...

2007

Selective deposition of gold nanoparticles using Van der Waals interactions

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Gold nanoparticles with hydrophobic surface have been deposited on a silicon substrate chemically patterned by reactive ion etching through a stencil mask and chemical vapour deposition of alkyl silanes. After deposition by dipping and adequate rinsing, th ...

2007

Quick & Clean: Advances in High Resolution Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet

2007

Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Sébastien Gauthier

Stencil lithography is used for patterning and connecting nanostructures with metallic microelectrodes in ultrahigh vacuum. Microelectrodes are fabricated by static stencil deposition through a thin silicon nitride membrane. Arbitrary nanoscale patterns ar ...

AIP American Institute of Physics2007

A Compact and Low-Power CMOS Circuit for Fully-Integrated NEMS Resonators

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

This brief presents a fully integrated nanoelectromechanical system (NEMS) resonator, operable at frequencies in the megahertz range, together with a compact built-in CMOS interfacing circuitry. The proposed low-power second-generation current conveyor cir ...

2007

Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The ap ...

IEEE2007

Permalloy thin films exchange coupled to arrays of cobalt islands

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Periodic arrays of elongated cobalt islands exchange coupled to continuous Permalloy thin films were fabricated using silicon nitride stencil masks and the magnetic spin configurations during magnetization reversal were studied with photoemission electron ...

AIP American Institute of Physics2006

Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano, Helmut Knapp

Microstencil lithography, i.e. local deposition of micrometer scale patterns through small shadow masks, is a promising method for metal micropattern definition on polymer substrates that cannot be structured using organic-solvent-based photoresist technol ...

2006

Silicon Supported Membranes for Improved Large-Area and High-Density Micro/Nanostencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

In this paper, the fabrication and use of stencils for full-wafer scale shadow mask (stencil) lithography is described. The stencils fabricated via microelectromechanical systems are mechanically stabilized and show clearly reduced stress-induced membrane ...

Institute of Electrical and Electronics Engineers2006

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Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano, Helmut Knapp

2006

Predicting mask distortion, clogging and pattern transfer for stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

2007

Synthesis of localized 2D-layers of silicon nanoparticles embedded in a SiO2 layer by a stencil-masked ultra-low energy ion implantation process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wiley2007