In-situ stabilization of membranes for improved large-area and high-density nanostencil lithography
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Sub-micron scale lithography methods using deep UV, X-ray or electron beams will allow for further progress in integrated circuit hardware manufacturing. The drawback of these high-end patterning methods however is firstly, the high cost of the equipment, ...
A versatile method for parallel nanoscale structures fabrication and patterning, using a combination of stencil-mask and pulsed-laser deposition (PLD) techniques is presented. A miniature shadow-mask with nano-apertures in a very thin microfabricated membr ...
We propose and demonstrate the ability and efficiency of using a universal file format for a nanolithography pattern. A problem faced by the physicists working in the field of nanolithography is a lack of a flexible pattern design software (possibly open–s ...
Electrodeposition on Highly Oriented Pyrolytic Graphite (HOPG) steps has been proven to be an easy method for the preparation of metal (Pd, Cu, Ag etc) and metal oxide or sulfide (MoO2, MnO2, MoS2) nanowires in recent years. These wires can be transferred ...