Publication

Fabrication and characterization of metal nanolevers made by shadow mask technology

Publications associées (34)

Etching selectivity and passivity of Al2O3 layers

The project focuses on etching properties of the atomic layer deposition (ALD) of Al2O3. For this purpose, etching processes such as plasma etch with sulfur hexafluoride (SF6), gas etch with xenon difluoride (XeF2), wet etch with MIF developer (726 MIF) as ...

2023

Plasma-Assisted Hybrid Vapour Deposition Technology for Thin Film Fabrication

Caroline Hain

Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...

EPFL2023

Annealing and Etching Processes for Hafnium Carbide MEMS

Nicolas Andres Avellan Marin

HfC has been very under-investigated due to its rarity and synthesising difficulty. Its potential for MEMS and NEMS applications has been recognized and is the object of an ongoing feasibility study for production since 2022. We continue on this impulse by ...

2023

Fabrication of glass suspended microchannel resonators

The goal of this project was to study if the fabrication of glass suspended microchannel resonators was possible. Through trial and error, the process parameters were determined, starting from the ideal dose in the dry etching process. The ideal size was d ...

2021

Single crystal diamond micro-disk resonators by focused ion beam milling

Niels Quack, Teodoro Graziosi, Sichen Mi

We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm x 3 mm x 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling. The resulting structures are ...

AMER INST PHYSICS2018

Optimization of Sputter Deposition Process for Piezoelectric AlN Ultra-Thin Films

Kaitlin Marie Howell, Roman Welz

The sputtering conditions for the deposition of the layers underneath active AlN films were analyzed for improving the quality of the active AlN, and the dependence of AlN deposition temperature on crystalline quality was investigated, where a reduced depo ...

2017

Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)

Nicolas Grandjean, Jean-François Carlin, Raphaël Butté, Ian Michael Rousseau

We report a numerical and experimental investigation of fabrication tolerances and outcoupling in optically pumped III-nitride nanolasers operating near lambda = 460 nm, in which feedback is provided by a one-dimensional photonic crystal nanobeam cavity an ...

Spie-Int Soc Optical Engineering2016

Multilevel Micro-Structuring of Glassy Carbon Molds for Precision Glass Molding

Hans Peter Herzig, Toralf Scharf, Karin Prater

Replication techniques for diffractive optical elements (DOEs) in soft materials such as plastic injection molding are state of the art. For precision glass molding in glasses with high transition temperatures, molds with extreme thermal resistivity, low c ...

Spie-Int Soc Optical Engineering2015

Metal-coated silicon micropillars for freestanding 3D-electrode arrays in microchannels

Carlotta Guiducci, Samuel Kilchenmann, Elena Bianchi, Enrica Rollo

This paper presents a fabrication process for arrays of high-aspect-ratio micropillar electrodes, which are freestanding 3D structures that feature metal sidewalls connected to passivated planar wires. Facing vertical electrodes are considered to be a key ...

Elsevier2013

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

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