Silicon oxide particle formation in RF plasmas investigated by infrared absorption spectroscopy and mass spectrometry
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The absorption spectrum of C60 embedded in Ne matrixes in the 410-360 nm region is revisited. A complete assignment of the absorption lines therein is proposed in terms of transition to the ungerade states 1 1G1u, 1 1T1u and 2 1T1u states, with progression ...
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With a view toward laser isotope separation of Si, we have studied infrared multiphoton dissociation (IRMPD) of room temperature trichlorosilane, SiHCl3. Over the wavelength range investigated, multiphoton dissociation of the room temperature species exhib ...
The formation of sub-micron sized particulates has been studied in a low pressure (0.1 mbar) radio-frequency (13.56 MHz) capacitively coupled plasma discharge. Particles are studied in situ by infrared absorption spectroscopy, laser illumination and Cavity ...
The gas phase species produced in rf plasmas of hexamethyldisiloxane (HMDSO), Si2O(CH3)(6), diluted with oxygen, have been investigated. The complementarity of Fourier transform infrared absorption spectroscopy and mass spectrometry allows the determinatio ...
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Boron nitride films were deposited by r.f. capacitively-coupled plasma (13.56 MHz) using two different gas mixtures: Ar-B2H6-NH3 and Ar-B2H6-N-2. In order to study the gas-phase reactions of the plasma in situ Fourier transform infrared absorption spectros ...