Stencil assisted reactive ion etching for micro and nano patterning
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A 2×2 microfluidic-based optical switch is proposed and demonstrated. The switch is made of an optically clear silicon elastomer, Polydimethylsiloxane (PDMS), using soft lithography. It has insertion loss smaller than 1 dB and extinction ratio on the order ...
Light-coupling masks (LCMs) based on structured organic polymers that make conformal contact with a substrate can constitute an amplitude mask for light-based lithographies. The LCM is exposed through its backside, from where the light is differentially gu ...
Sub-micron lithography processes are continuously optimized for semiconductor products where the enormous market potential justifies investment in advanced methods and extremely sophisticated equipment. Due to the extreme process costs and due to the limit ...
Increased flexibility in patterning becomes important for the engineering of advanced nano/micro-electro-mechanical systems (NEMS/MEMS). Surfaces to be structured are either mechanically unstable and/or (bio-) chemically functionalized, such as ultra-thin ...
Sub-micron scale lithography methods using deep UV, X-ray or electron beams will allow for further progress in integrated circuit hardware manufacturing. The drawback of these high-end patterning methods however is firstly, the high cost of the equipment, ...
We describe an approach to optical lithography using light-scattering contact masks with protruding elements that couple light into a photoresist. This method differs from conventional contact lithography in two important ways. First, because portions of t ...
A novel local illumination scheme for optical lithography is proposed. It is based on the excitation of a surface plasmon on a metal film incorporated into a polymer light coupling mask for contact lithography. The electromagnetic field associated with the ...
