Fabrication of planar chiral photonic meta-materials on SU- 8 using nanoimprint lithography technique

Yi-Chiang Sun, Shenqi Xie
2007
Article de conférence

We present a photonic meta-material with planar dielectric chiral structures on SU-8 realized using nanoimprint lithography (NIL). A Si template with chiral structure arrays was first fabricated by electron beam lithography (EBL) followed by reactive ion etch (RIE). The chiral pattern on the template was then transferred to a SU-8 layer spin coated on Pyrex using an in-house developed press. The imprint property of SU-8 under various pressures and temperatures was systematically studied. The optimized imprint process was successfully applied for the fabrication of planar chiral structure in SU-8. The periodically distributed chiral elements form a photonic crystal with the pitch of 4 μm. Optical diffraction of such kind of periodically arranged chiral structures in SU-8 has been observed for the first time.

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Yi-Chiang Sun, Shenqi Xie
2007
Article de conférence

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https://infoscience.epfl.ch/record/135199?ln=fr

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Nanoimprint lithography

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by me

Gravure ionique réactive

La gravure ionique réactive - ou gravure par ions réactifs - très souvent appelée par son acronyme anglophone, RIE (pour Reactive-Ion Etching), est une technique de gravure sèche des semi-conducteurs.

Métamatériau

En physique, en électromagnétisme, le terme métamatériau désigne un matériau composite artificiel qui présente des propriétés électromagnétiques qu'on ne retrouve pas dans un matériau naturel. Il s

Nanophotonic crystals with chiral elements by a hot embossing process in SU-8

Yi-Chiang Sun, Shenqi Xie

We report a novel nanoprocess to fabricate 2D metallic and non-metallic nanophotonic crystals on SU-8 using hot embossing combining with a UV-curing process. The fabricated photonic crystals were characterized by optical diffraction experiments. Theoretical simulation of the light diffraction through such kind of artificial crystals agrees with the measured optical property very well, indicating that the developed fabrication technique is able to produce large area nanosize photonic crystals at economic costs. The success of this work not only provides scientists with a good opportunity to pioneer novel photonic physics in metallic and non-metallic chiral as well as photonic crystal systems, but also bridges the gap between laboratory and industrial application for mass production of photonic nanostuctures.

2008

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Development of novel SU-8 based nanoimprint lithography

Shenqi Xie, Rong Yang

We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion etch (RIE), and then duplicated by the SU-8/SiO2/PMMA tri-layer technique we developed. Imprint properties such as pressure and temperature are determined to fabricate different nanostructures with various imprint depth. The developed processes, which provide us the capability to fabricate both imprinted nanostructures on resist and transferred nanopatterns on substrate with high volume and low cost, are further applied in producing high density gratings, planar chiral photonic metamaterials, and nanofluidics channels.

2008

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Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography

Yi-Chiang Sun, Shenqi Xie

We present the fabrication of 150 nm half-pitch Si grating templates by reactive ion etch (RIE), which are used in nanoimprint lithography (NIL) for high groove density gratings in SU-8 plastic. The etch properties such as the etch rate, profile and etching selectivity of Si over Cr as etch mask were carefully studied. Under the optimum condition Si gratings with 150 nm in linewidth, 480 nm in height and nearly 90 degree in verticality of the sidewall have been achieved. 150 nm half-pitch gratings on SU-8 were then successfully imprinted using the fabricated templates. The diffraction pattern of zeroth and first order from the SU-8 gratings was observed using a 266 nm laser beam. The developed nanofabrication technique in this work is applicable not only for templates but also for other nanostructures in silicon.

2008

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