Nano-patterning of solid substrates by adsorbed dendrimers
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Nanofluidic systems offer a huge potential for discovery of new molecular transport and chemical phenomena that can be employed for future technologies. Herein, we report on the transport behavior of surface-reactive compounds in a nanometer-scale flow of ...
Thermal scanning probe lithography is a novel lithographic method that allows to create three dimension pattern with high precision at the micro and nano scale. In this project, the impact of two important parameters (the distance be- tween the tip and the ...
The rapidly evolving field of 2D materials has developed a plethora of emerging micro/nano devices where atomically-thin materials play a fundamental role. In most cases, this implies the need of nanostructuring them, but due to their delicate nature, conv ...
The development of nanosystems and nano-devices demands for patterning methods in the nanoscale. To bring them to the market, there is a need for fast, low-cost nanopatterning methods. In addition, an increased flexibility is important for the engineering ...
Lithography on (100) single-crystal silicon and amorphous silicon is performed by electric-field-enhanced local oxidation of silicon using an atomic force microscope (AFM). Amorphous silicon is used as a negative resist to pattern silicon oxide, silicon ni ...
Micro-mechanical systems are exquisite tools for high-resolution surface patterning. As an alternative to traditional photolithography, they can be used for local material deposition at the sub-100 nm scale. This can be either done by means of liquid dispe ...
The endeavour to develop nanodevices demands for patterning methods in the nanoscale. To bring nanodevices to the market, there is a need for fast, low-cost replication nanopatterning methods. In addition, an increased flexibility of the nanopatterning met ...
Photoresist-based lithography has major limitations if applied to MEMS with mechanically fragile and chemically functionalized surfaces. As remedy, new alternative and complementary nanopatterning methods have been developed, such as thermo-mechanical inde ...
2004
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Photoresist-based lithography has major limitations when applied to micro-electro-mechanical systems (MEMS) with mechanically fragile and/or chemically functionalised surfaces. As a remedy, alternative, complementary nanopatterning methods have been develo ...
2004
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The endeavour to develop nanodevices demands for patterning methods in the nanometer scale. The continuous improvement in lithography methods based on deep UV (DUV), X-ray, or electron beam exposure allow for further progress in integrated circuit hardware ...