The photolytic laser chemical vapor deposition rate of platinum, its dependence on wavelength, precursor vapor pressure, light intensity, and laser beam diameter
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In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...
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Surface deposition is a critical step in the application of fragrance-containing products. This contribution presents a novel strategy to enhance the deposition of polymer-based fragrance delivery systems onto cotton substrates from the application medium ...
The sputtering conditions for the deposition of the layers underneath active AlN films were analyzed for improving the quality of the active AlN, and the dependence of AlN deposition temperature on crystalline quality was investigated, where a reduced depo ...
One challenge for microcrystalline silicon (mu c-Si:H) deposition is to achieve high deposition rates while maintaining high quality films. In this work, an inductively-coupled plasma (ICP) is used to deposit mu c-Si:H on glass substrates by means of a nov ...