Physical Properties of Al1-xInxN/(AIN)/GaN (0.07<=x<=0.21) Heterostructures and their Application for High Power Electronics

AlInN is a material which is known to be difficult to be grown among the III-nitride ternary compounds. It attracted much attention only recently and starts to be studied intensively mainly for electronic applications. The aim of this work is manifold. Various structural, electrical and optical measurements are brought together to underline the outstanding quality of AlInN epi-layers grown by metalorganic vapor phase epitaxy (MOVPE). Especially the electrons confined at the heterointerface of coherently grown AlInN on GaN buffer layers determine crucially the electronic properties. An appropriate model based on charge balance is proposed allowing the extraction of all significant electrical properties. An AlN interlayer has been introduced at the AlInN/GaN interface and was found to tremendously affect transport properties. This issue is studied intensively and results indicate that even slightest deviations from atomically perfect interfaces leads to the creation of huge piezoelectric fields disturbing carrier transport in the case of strongly mismatched epilayers. A similar debate was conducted concerning the localization of carriers in InGaN quantum wells. High electron mobility transistors (HEMT) processed from these heterostructures exhibits excellent device performance exceeding 2 A/mm even on sapphire substrates. This are the highest currents ever reported for nitride heterostructures. The same structures grown on Si(111) substrates allow reaching cut-off frequency in excess of 100 GHz . However, results are puzzling and on at first sight striking since the device saturation currents of structures grown on SiC are similar to results on sapphire despite its much larger thermal diffusivity. Therefore we studied the temperature arising in the device under applied voltages using a micro-photoluminescence (µPL) setup. To our knowledge this is the first study of this type. The main advantage is the use of the short wavelength for excitation in comparison with well-established Raman methods. However we find from this analysis a significant heat development up to 1200 K for devices with 5 µm drain-source distance. The heating can be understood in terms of excited optical phonons due to field accelerated electrons under applied voltages. The comparison of the available amount of phonons in the finite volume covered by the 2D electrons and the number of created phonons in the acceleration process allows formulating a simple relation for the saturation currents as a function of the transport properties. However, this mechanism also explains why the saturation currents are far below expected values from simple velocity saturated currents models and independent of the substrate. However, heat, i.e. the decomposition of local optical phonons into acoustical phonons with large group velocity, is dissipated differently depending on substrate influencing therefore mainly the reliability of the devices. Beside the electrical breakdown due to avalanche carriers a second thermally induced breakdown mechanisms is proposed. Finally, the capability of those heterostructures for sensing is discussed. Especially the electrically response on external stimulus such as UV radiation and the exposition of the surface to polar liquids is investigated.

Leakage mechanisms and contact technologies in InAlN/GaN high electron mobility transistors

Lorenzo Lugani

GaN based electronic devices have progressed rapidly over the past decades and are nowadays starting to replace Si and classical III-V semiconductors in power electronics systems and high power RF amplifiers. AlGaN/GaN heterostructures have been, until recently, the materials system of choice for nitride based electronics. The limits of AlGaN/GaN technologies are now known and alternative routes able to overcome them are actively investigated. Nearly lattice-matched InAlN/GaN heterostructures have emerged as viable solutions for extending the frequency range achievable by GaN based devices. These heterostructures have also proven a very high thermal stability, becoming of high interest for extreme environment applications. However, despite those great potentials, InAlN/GaN based devices, in particular high electron mobility transistors, have suffered from high leakage currents, strong short channel effects and low breakdown voltage that made them not competitive with respect to AlGaN/GaN technologies. The goal of this thesis is to investigate, understand and control the mechanisms that limit the performance of InAlN/GaN based transistors. Particular attention in this thesis will be given to leakage currents, having gate or buffer origin. Concerning gate leakage currents, an accurate model for InAlN/GaN heterostructures will be established and the expected presence of deep levels will be confirmed by means of photocapacitance spectroscopy. Based on these results, it will be shown that two conduction mechanisms contribute to gate leakage currents. A first mechanism dominates in heterostructures with thin (

EPFL2015

Functional properties of III-V nanowires addressed by Raman spectroscopy

Francesca Amaduzzi

In recent years, semiconductor nanowires have attracted considerable attention as a result of their unique properties and potential applications in many fields. In particular, they can be very attractive materials for certain optoelectronic and electronic devices, such as lasers, detectors and solar cells, which benefit from the photonic properties of nanowires. In order for these future technologies to become a reality, a good understanding of the functional properties of nanowires is fundamental. In this thesis we have investigated the optical and the electrical properties of III-V semiconductors nanowires by the means of Raman spectroscopy. Thanks to its non-destructive and spatial resolution, Raman spectroscopy is a powerful contact-less tool for the characterization of semiconductor nanowires. Raman spectroscopy can provide information about crystallinity, orientation, size and chemical composition. In polar semiconductors it is also possible to characterize the free carriers, through the coupling of plasmons with longitudinal optical modes. Due to the small size and particular morphology of nanowires, the interaction of light can be more complex than in thin films. In particular, the existence of photonic modes alters significantly the corresponding light-matter interaction. In this thesis we exploit the use of photonic modes for the compositional mapping of nanowire core-shell heterostructures and also to circumvent the macroscopic selection rules. In the first part of this thesis, we have performed Raman scattering measurements on GaAs/AlGaAs core/shell nanowires. We have shown that it is possible to select and characterize regions of the structure with different Aluminum content, by performing the measurements at different laser wavelengths. Then, we have shown that the photonic modes can be modified by suspending the nanowires on a trench. We have shown that in this case it is possible to enhance the response of the longitudinal optical phonon mode. We have then applied this configuration for the characterization of the hole concentration on p-type GaAs nanowires in back-scattering geometry. The second part of the thesis focused on the assessment of free carriers by Raman spectroscopy in systems with an expected high electron mobility: GaAs nanowires with a modulation doped structure and InAs(Sb) nanowires. Raman measurements were performed as a function of the temperature on modulation doped GaAs/AlGaAs nanowire. By characterizing the coupling between free carrier and the LO phonons, we have extracted the concentration and the mobility of carriers. We have found that Si donors are almost ionized for a temperature above 50 K. We have shown that the mobility is limited by interface scattering, with values of 400 cm^2/Vs at room temperature and 2700 cm^2/Vs at low temperature. Finally, we investigated the electronic properties of InAs(Sb) nanowires as a function of the temperature. The effect of a dielectric coating on the electronic properties was also studied. We have found an increase of mobility and electron concentration with the antimony content , moving from 5100 cm^2/Vs for InAs nanowires, to 17500 cm^2/Vs for InAsSb with 35% of antimony at 14K. Moreover, we have shown that in the case of InAs electrons are located in the accumulation layer at the surface, while for InAsSb our measurements are consistent with the carriers located in the nanowire core.

EPFL2017

Lattice-matched AlInN alloys for nitride-based optoelectronic devices

Julien Dorsaz

Gallium Nitride (GaN) and its ternary alloys with aluminium and indium have met a growing interest in the last decade. These semiconductors have a large direct bandgap and can be doped with either silicon (Si) for n-type and magnesium (Mg) for p-type layers. Consequently, they are attractive targets for the fabrication of electrically driven light-emitting diodes, laser diodes and photodetectors, operating in the UV and visible range. Nitride semiconductors are also robust ans stable at high temperatures, suggesting their use in high frequency – high power electronic devices. The research on the III-nitride semiconductors is still in its infancy and, although several devices have been demonstrated and commercialized, there are still many issues to be solved. In particular, the III-nitride materials suffer from the lack of an adequate lattice-matched substrate for epitaxial growth, the high density of defects and dislocations, the poor quality of the p-type layers (low hole concentration and mobility), localization effects in indium containing layers, chemical inertness, etc… Also, due to the material quality issues, some electrical and optical parameters are only approximatively known. AlInN alloys have not attracted much attention compared to the InGaN and AlGaN ternary alloys, due to their unstable growth conditions. High-quality AlInN layers were deposited by metalorganic vapor-phase epitaxy (MOVPE). AlInN with an indium content of 18% is lattice-matched to GaN. It has a bandgap energy of about 4.35 eV and a refractive index contrast to GaN of 7% at 450 nm. It is shown that the optical, electrical and structural characteristic of epitaxial AlInN layers start degrading above a critical thickness of 200 nm, due to an ongoing pollution of the MOVPE reactor by products of the reaction. The distributed Bragg reflector (DBR) is an essential building block for advanced optoelectronic devices such as vertical-cavity surface emitting lasers (VCSELs). The introduction of the lattice-matched AlInN quarter-layers allows to grow thick DBR structures, with limited strain issues. It is used with GaN quarter-layers for visible reflectors and AlGaN quarter-layers for UV reflectors Optimizing the growth conditions of AlInN layers leads to the realization of DBRs with reflectivity above 99 % in the blue wavelength range (410-450 nm) as well as in the UV wavelength range (345 nm). The novel AlInN/GaN DBR is introduced in various microcavity LED (MCLED) structures. The basic features of the MCLED devices are presented, as well as optical simulations obtained using the transfer matrix representation (TMR) formalism, coupled with a dipole approximation for source terms. Electrical characterizations on these devices show that an intra-cavity contact (ICC) scheme should be used to achieve a sufficient electron injection in the active region. The external quantum efficiency of MCLED devices with thick AlInN/GaN DBRs (12 pairs) were lower than expected, due to the degradation of the crystalline quality of the active layers caused by the pollution of the reactor. Another requirement for the realization of a nitride VCSEL is the optimization of the electrical injection of carriers in the optical cavity. Assuming that circular metallic contacts are used, the carriers should spread laterally and be injected in the active region under the top DBR. This is generally achieved by the combination of a current spreading cap layer, which helps for the lateral injection of the carriers, and a current confinement layer, which inhibit the injection of the carriers in the active region outside of the vertical cavity. For the III-nitride structures, several methods are available for the lateral injection: n+/p+ tunnel junctions, doped-AlGa(In)N/GaN superlattices, semi-transparent electrodes, etc… A novel technique is developed to oxidize selectively surface or buried AlInN layers and form a stable, semi-insulating compound, with a refractive index of about 1.8. A detailed description of the technique is presented. It can be applied to form current confinement layers in VCSELs, but also layers for high reflectivity distributed Bragg reflectors (DBRs), layers for improved light confinement in planar waveguides or insulating buffer layers for field effect transistors (FETs). Also, oxidized AlInN could be used as a sacrificial layer for the preparation of free-standing GaN substrates. In this work, the technique was applied to form a current confinement aperture in a LED device. A buried AlInN layer was oxidized laterally, leaving a small 5 µm aperture in a 28 µm × 28 µm mesa structure. Optical and electrical confinement are demonstrated. With the availability of a high-reflectivity lattice-matched nitride DBR and a technique to produce small current apertures, both based on the new AlInN material, the realization of an electrically injected VCSEL becomes a realistic goal. An ideal structure is realized and discussed.