Publication

Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes

Publications associées (51)

Graph Chatbot

Chattez avec Graph Search

Posez n’importe quelle question sur les cours, conférences, exercices, recherches, actualités, etc. de l’EPFL ou essayez les exemples de questions ci-dessous.

AVERTISSEMENT : Le chatbot Graph n'est pas programmé pour fournir des réponses explicites ou catégoriques à vos questions. Il transforme plutôt vos questions en demandes API qui sont distribuées aux différents services informatiques officiellement administrés par l'EPFL. Son but est uniquement de collecter et de recommander des références pertinentes à des contenus que vous pouvez explorer pour vous aider à répondre à vos questions.

Connectez-vous pour utiliser Chat avec Graph Search

Surface Kinetics of Titanium Isopropoxide in Chemical Vapor Deposition of Titanium Dioxide and Barium Titanate

Michael Oliver Reinke

All chemical vapor deposition (CVD) processes rely on the adsorption and decomposition of precursors on a substrate to deposit the desired material. The growth rate of the film is determined by the surface kinetics of the utilized precursor molecules and g ...

EPFL2016

X-ray-induced Cu deposition and patterning on insulators at room temperature

Giorgio Margaritondo, Ying Chen

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and ...

International Union of Crystallography2015

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/ Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and ...

2015

Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Understanding the surface kinetics of precursor decomposition during thin film formation represents a key aspect in the understanding and engineering of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The determination of activ ...

American Chemical Society2015

Solid on liquid deposition, a review of technological solutions

Roland Andreas Bitterli, Laure Jeandupeux

Solid-on-liquid deposition (SOLID) techniques are of great interest to the MEMS and NEMS (Micro- and Nano Electro Mechanical Systems) community because of potential applications in biomedical engineering, on-chip liquid trapping, tunable micro-lenses, and ...

Elsevier2015

, , ,

CH3NH3PbI3 was found to exhibit inverse solubility at high temperatures in gamma-butyrolactone. Making use of this unusual, so far unreported phenomenon, we present a facile method for the growth of freestanding crystals of CH3NH3PbI3 from solution without ...

Nature Publishing Group2015

Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

A key factor in engineering integrated optical devices such as electro-optic switches or waveguides is the patterning of thin films into specific geometries. In particular for functional oxides, etching processes are usually developed to a much lower exten ...

Amer Chemical Soc2015

Thermal energy in dry snow avalanches

Michael Lehning, Walter Steinkogler

Avalanches can exhibit many different flow regimes from powder clouds to slush flows. Flow regimes are largely controlled by the properties of the snow released and entrained along the path. Recent investigations showed the temperature of the moving snow t ...

Copernicus Gesellschaft Mbh2015

Chemical Modification of Graphene via Hyperthermal Molecular Reaction

Klaus Kern, Marko Burghard, Stephan Rauschenbach, Sabine Abb, Gordon Rinke

Chemical functionalization of graphene is achieved by hyperthermal reaction with azopyridine molecular ions. The one-step, room temperature process takes place in high vacuum (10(7) mbar) using an electrospray ion beam deposition (ES-IBD) setup. For ion su ...

Amer Chemical Soc2014

This work consists in an experimental study of the main parameters governing the transport of heat across an interface between two solids, when it is dominated by phonons. The main experimental tool used is Time-Domain ThermoReflectance (TDTR), which is an ...

EPFL2013