Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Estelle Wagner, Giacomo Benvenuti
2011
Article

Résumé

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Source officielle

https://infoscience.epfl.ch/record/178591?ln=fr

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Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

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