Analysis of resonant planar dissipative network antennas for rf inductively coupled plasma sources

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling
Iop Publishing Ltd, 2014
Article

Résumé

The analysis of a radio-frequency (RF) planar antenna is presented for applications in plasma processing. The antenna is a network of elementary meshes composed of inductive and capacitive elements which exhibits a set of resonant modes. The high currents generated by RF power feeding under resonance are efficient for plasma generation. A general solution is derived for the currents in the driven dissipative network for these conditions. The dominantly real input impedance near antenna resonance avoids the high reactive currents and voltages in the matching box and RF power connections which can be a problem with conventional large-area capacitively and inductively coupled plasma sources. The driven antenna can be approximated by a parallel resonance equivalent circuit whose input impedance can conveniently be measured to interpret the dissipation due to the plasma.

Official source

https://infoscience.epfl.ch/record/198378?ln=fr

À propos de ce résultat

Cette page est générée automatiquement et peut contenir des informations qui ne sont pas correctes, complètes, à jour ou pertinentes par rapport à votre recherche. Il en va de même pour toutes les autres pages de ce site. Veillez à vérifier les informations auprès des sources officielles de l'EPFL.

Concepts associés

Chargement

Publications associées

Chargement

Plasma generation by inductive coupling with a planar resonant RF network antenna

Philippe Frédérique Bruno Guittienne, Christoph Hollenstein, Alan Howling, Sylvain Lecoultre

A planar antenna operating at 13.56MHz is presented for potential applications in plasma processing. It consists of interconnected elementary resonant meshes composed of inductive and capacitive elements. Due to its structure, the antenna exhibits a set of resonant modes associated with peaks of the real input impedance. Each mode is defined by its particular distribution of current and voltage oscillating at the frequency of the mode. A rectangular antenna of 0.55m x 0.20m has been built and first results obtained with argon plasmas are presented. Efficient plasma generation is shown by plasma densities above 3 x 10(17) m(-3) at 2000 W with reasonable uniformity over the antenna area. The plasma couples inductively with the resonating currents flowing in the antenna above a threshold power of about 60 W. The real input impedance at antenna resonance avoids the problem of strong reactive currents and voltages in the matching box and RF power connections associated with conventional large-area plasma sources. Resonant RF networks have a strong potential interest for various designs of plasma sources.

2012

Chargement

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Hannes Schmidt

Experiments using a lens-shaped circular electrode are described to measure the correction of plasma nonuniformity due to the standing wave effect in a large area very high frequency plasma reactor. This work is the experimental verification of the theoretical reactor design in cylindrical geometry recently presented by L. Sansonnens and J. Schmitt, Appl. Phys. Lett. 82, 182 (2003). It is found that the lens-shaped electrode effectively compensates the standing wave effects by creating a uniform rf vertical electric field in the plasma volume. The plasma is uniform, except for edge effects, for a wide range of parameters and consequently the design is suitable for plasma processing. (C) 2004 American Institute of Physics.

2004

Chargement

, ,

Large-area and large-volume radio frequency (RF) plasmas are produced by different arrangements of an elementary electrical mesh consisting of two conductors interconnected by a capacitor at each end. The obtained cylindrical and planar RF networks are resonant and generate very high RF currents. The input impedance of such RF networks shows the behaviour of an RLC parallel resonance equivalent circuit. The real impedance at the resonance frequency is of great advantage for power matching compared with conventional inductive devices. Changes in the RLC equivalent circuit during the observed E-H transition will allow future interpretation of the plasma-antenna coupling. Furthermore, high power transfer efficiencies are found during inductively coupled plasma (ICP) operation. For the planar RF antenna network it is shown that the E-H transition occurs simultaneously over the entire antenna. The underlying physics of these discharges induced by the resonant RF network antenna is found to be identical to that of the conventional ICP devices described in the literature. The resonant RF network antenna is a new versatile plasma source, which can be adapted to applications in industry and research.

Iop Publishing Ltd2013

Chargement