Publication

Structure and electronic properties of AlCrOxN1-x thin films deposited by reactive magnetron sputtering

Publications associées (39)

Graph Chatbot

Chattez avec Graph Search

Posez n’importe quelle question sur les cours, conférences, exercices, recherches, actualités, etc. de l’EPFL ou essayez les exemples de questions ci-dessous.

AVERTISSEMENT : Le chatbot Graph n'est pas programmé pour fournir des réponses explicites ou catégoriques à vos questions. Il transforme plutôt vos questions en demandes API qui sont distribuées aux différents services informatiques officiellement administrés par l'EPFL. Son but est uniquement de collecter et de recommander des références pertinentes à des contenus que vous pouvez explorer pour vous aider à répondre à vos questions.

Connectez-vous pour utiliser Chat avec Graph Search

Thermal Boundary Conductance between metals and dielectrics

Christian Monachon

This work consists in an experimental study of the main parameters governing the transport of heat across an interface between two solids, when it is dominated by phonons. The main experimental tool used is Time-Domain ThermoReflectance (TDTR), which is an ...

EPFL2013

High Temperature Behavior of Nano-Structured Ceramic Composites Studied by Mechanical Spectroscopy

Mehdi Mazaheri

Silicon nitride based ceramics (SiAlONs); tetragonal polycrystalline zirconia (3Y‐TZP); alumina and their composites reinforced with different amount of multi‐ walled carbon‐nanotubes (CNTs) have been processed by Spark Plasma Sintering (SPS). High tempera ...

EPFL2013

Oxynitride thin films, a novel class of mixed anionic solid structures, have gained an intense interest during recent years related to the unique interplay of oxygen (O) and nitrogen (N) with metals in the material structure. This matter can result in spec ...

EPFL2012

Material Study of Micromachined Thin Film Solid Oxide Fuel Cells

Yan Yan

Miniaturized, low temperature Solid Oxide Fuel Cells (SOFCs) that operate below 600 °C are promising for supplying electrical power to portable devices. Thin electrolyte membranes of less than one micrometer thickness have been shown to yield reasonable po ...

EPFL2012

This work presents the Continuous Wave (CW) laser crystallization of thin amorphous silicon (a-Si) films deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and by Electron Beam Evaporation (EBE) on low cost glass substrate. The films are charac ...

2012

TaOxNy Sputtered Photoanodes For Solar Water Splitting

Michael Graetzel, Kevin Sivula, Vincent Laporte, Rosendo Sanjines, Nicolas Xanthopoulos, Maurin Cornuz

A series of TaOxNy photoelectrodes were deposited on F:SnO2 (FTO) substrates by DC reactive sputtering at room temperature, under a mixture of Ar, N-2 and O-2. The effects of the O-2 partial pressure during deposition (Po-2) on the films crystallinity, the ...

Elsevier Science Bv2012

On the Powder Formation in the Plasma Enhanced Chemical Vapor Deposition Process for the Deposition of SiOx Barrier Coatings

Marina Ricci

Nowadays thin films play an important role in everyday life and in industries. Thin film technology has been developed primarily for the growing demand for development of smaller and smaller devices that require advanced materials and new processing techni ...

EPFL2011

Al95.5Cr2.5Si2(N1-xOx) thin films were prepared using pulsed DC-magnetron sputtering at 650 degrees C by changing the oxygen to nitrogen ratio (O-2/(O-2 + N-2)) in the reactive gas. The obtained films were characterized by various techniques including XRD, ...

2011

Correlation between anionic substitution and structural properties in AlCr(OxN1-x) coatings deposited by lateral rotating cathode arc PVD

Alireza Karimi, Hossein Najafi

The influence of oxygen content on the properties of cathodic arc-deposited AlCr(OxN1-x) coatings has been studied. All samples were prepared in a nitrogen-rich mixture of N-2 and O-2 at 550 degrees C using lateral rotating arc cathodes (LARC) technology t ...

2011

Multi-element oxynitrides of type Al-Cr-Si-O-N were prepared using r.f. magnetron sputtering from Al80Cr2.5Si17.5 (at.%) target composition and O-2/(O-2+N-2) gas flow ratio between 0 and 100%. Two series of samples varying from pure nitrides to pure oxides ...

2010