Dye-sensitized sputtered titanium oxide films for photovoltaic applications: influence of the O2/Ar gas flow ratio during the deposition

Ulf Anders Hagfeldt, Monica Marcela Gomez Leon
2003
Article

Résumé

Titanium oxide films were prepd. by reactive DC magnetron sputtering onto SnO2:F coated glass substrates. The O2/Ar gas flow ratio was kept at a const. value Γ during the deposition, and a series of films were deposited with 0.050

Source officielle

https://infoscience.epfl.ch/record/209445?ln=fr

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Dye-sensitized sputtered titanium oxide films for photovoltaic applications: influence of the O2/Ar gas flow ratio during the deposition

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