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Non-linear simulations of the TCV Scrape-Off Layer

Publications associées (32)

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Barium titanate is a very promising material for the integration of optical communication into electronic integrated circuits. For a successful integration into CMOS compatible technology, a growth process has to be found which allows forming crystalline B ...

Wiley-VCH Verlag Berlin2015

Solid on liquid deposition, a review of technological solutions

Roland Andreas Bitterli, Laure Jeandupeux

Solid-on-liquid deposition (SOLID) techniques are of great interest to the MEMS and NEMS (Micro- and Nano Electro Mechanical Systems) community because of potential applications in biomedical engineering, on-chip liquid trapping, tunable micro-lenses, and ...

Elsevier2015

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Thin films of oxide materials are widely used for various types of applications. The selection of an appropriate deposition method depends on the aimed material and application. We review here a high vacuum chemical vapour deposition (HV-CVD) method, which ...

Elsevier2013

Thermal Boundary Conductance between metals and dielectrics

Christian Monachon

This work consists in an experimental study of the main parameters governing the transport of heat across an interface between two solids, when it is dominated by phonons. The main experimental tool used is Time-Domain ThermoReflectance (TDTR), which is an ...

EPFL2013

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

Christoph Hollenstein, Alan Howling, Boris Legradic, Michaël Chesaux

The interplay of gas flow and depletion by plasma dissociation determines the spatial distribution of species and the deposition uniformity in a plasma source. Many plasma reactors use a gas showerhead and the design of the flow dynamics is a critical aspe ...

2012

Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes

Christoph Hollenstein, Philippe Frédérique Bruno Guittienne, Malko Gindrat

Conventional equipment for plasma spraying can be adapted for operation at low pressure so that PECVD-like processing can be performed. The plasma jet generated by the torch is characterized by a high convective velocity and a high gas temperature. The inf ...

Springer US2012

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A shadow mask-evaporated pyroMEMS igniter is presented. The metallization was successfully carried out without ignition or any visible degradation of the propellant charge during evaporation. Directly depositing the Joule-heating igniter onto the propellan ...

2010

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A systematic study of niobium oxide deposition using niobium tetraethoxy-dimethyl-amino-ethoxide (Nb(OEt)(4)(dmae)) precursor is presented. The deposition process was conducted in a high-vacuum chemical vapor deposition machine with precursor flux gradient ...

Iop Publishing Ltd, Dirac House, Temple Back, Bristol Bs1 6Be, England2010

High vacuum chemical vapor deposition (HV-CVD) of alumina thin films

Xavier Multone

We analyzed along this work the feasibility to produce high quality alumina thin films by High Vacuum Chemical Vapor Deposition (HV-CVD). We study the influence of various parameters on the growth process and on the film quality, such as substrate temperat ...

EPFL2009

Er-doped Al2O3 thin films deposited by high-vacuum chemical vapor deposition (HV-CVD)

Patrik Willi Hoffmann, Xavier Multone

Erbium-doped amorphous aluminum oxide layers deposited on Si or oxidized silicon substrates are promising construction pieces for future monolytic integrated optoelectronics devices. In a novel high-vacuum chemical vapor deposition setup the alumina films ...

2008