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The local bending of a silicon nanowire induces tensile strain in the wire due to the stretching of the silicon lattice. This in turn enhances the mobility of the free carriers (electrons) in the direction of transport along the wire. Thus, for example, when Gate-All-Around MOSFETs are fabricated along the nanowire, the mobility enhancement will translate into an improvement in the performance (current drive, speed) of the silicon nanowire MOSFETs. In summary, a semiconductor device comprises a substrate and a nanowire in connection with the substrate at a drain and at a source region, and the nanowire is bent to achieve enhanced mobility of charge carriers.
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