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Sputter Deposition Technology For Al((1-X))Sc(X)N Films With High Sc Concentration

Publications associées (40)

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Plasma-Assisted Hybrid Vapour Deposition Technology for Thin Film Fabrication

Caroline Hain

Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...

EPFL2023

Coating nano particles and other substrates for efficiency enhancement, protection and obtaining new atomic structures is a widespread research topic in catalysis and material synthesis. Thus far, different approaches of coating, ranging from simplest to s ...

EPFL2023

Deposition of Thin Alumina Films Containing 3D Ordered Network of Nanopores on Porous Substrates

Martina Lihter

Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an a ...

2020

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Scandium doped aluminium nitride (ScAlN) gained much attention during last years, since its piezoelectric response is much enlarged as compared to pure AlN films. Above 30% Sc the films are of high interest for piezoMEMS sensing and actuation, ultrasound g ...

IEEE2019

Thin film metal-insulator-metal capacitors with undoped HfO2 as the insulator are fabricated by sputtering from ceramic targets and subsequently annealed. The influence of film thickness and annealing temperature is characterized by electrical and structur ...

WILEY2019

AlScN thin films sputtering optimization

Kaitlin Marie Howell, Elliot Casimir Jean-Pôl Lauriere

Doping aluminium nitride with scandium is one of the recent techniques used to improve piezoelectric performance of thin films in the field of MEMS. Highly dependent on the sputtering parameters, the quality of these films is subject to complex optimizatio ...

2018

The sputtering conditions for the deposition of the layers underneath active AlN films were analyzed for improving the quality of the active AlN, and the dependence of AlN deposition temperature on crystalline quality was investigated, where a reduced depo ...

2017

Enhanced piezoelectric properties of c-axis textured aluminium scandium nitride thin films with high scandium content: influence of intrinsic stress and sputtering parameters

Paul Muralt, Gabriel Christmann, Silviu Cosmin Sandu, Stefan Mertin, Clemens Benedict Nyffeler, Mohammad Fazel Parsapour Kolour, Vladimir Pashchenko

Aluminium scandium nitride (ASN) exhibits a largely enhanced piezoelectric response as compared to aluminium nitride (AlN), which makes it an upcoming piezoelectric material for use in next generation RF filters, sensors, actuators and energy harvesting de ...

Ieee2017

Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...

American Chemical Society2016

Suspended micro resonator fabrication: atomic layer deposition

Annalisa De Pastina, Mathieu Basile Aberle

This project is focused on atomic layer deposition of aluminium oxide to fabricate suspended microchannel resonators. Few examples of the applications of such devices are blood analysis to detect cancerous cells or device cooling directly on the chip. The ...

2016