Strain engineering a 4a x root 3a charge-density-wave phase in transition-metal dichalcogenide 1T-VSe2
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We report on the growth by metalorganic vapor phase epitaxy of high-quality Al1-xInxN layers and AlInN/GaN Bragg mirrors near lattice matched to GaN. Layers are grown on a GaN buffer layer with no cracks over full 2 in. sapphire wafers. The index contrast ...
We report a thorough study of the growth of self-assembled GaN/AlN quantum dots (QDs). These QDs were grown on sapphire substrates using the Stranski-Krastanov (SK) growth mode by means of low-pressure metal organic vapor phase epitaxy. The influence of th ...
Thermally detected optical absorption (TDOA) and photoluminescence (PL) experiments are performed at 0.35 and 4 K, respectively, on InxGa1-xN(x less than or equal to 0.12) layers grown on GaN by molecular beam epitaxy. The modelling of absorption allows us ...
The subject of this thesis is the growth and analysis of high temperature superconductor (HTSC) films and the study of their electronic structure and properties. In particular, the effect of epitaxial strain is investigated, predominantly by means of in-si ...
We report on solar-blind metal-semiconductor-metal (MSM) detectors fabricated on stacks of (AI,Ga)N layers with different Al mole fraction. These structures were grown by molecular beam epitaxy on sapphire substrates to allow backside illumination and a lo ...
Gallium Nitride (GaN) and its ternary alloys with aluminium and indium have met a growing interest in the last decade. These semiconductors have a large direct bandgap and can be doped with either silicon (Si) for n-type and magnesium (Mg) for p-type layer ...
We report on the growth by molecular-beam epitaxy on 2 in. sapphire substrates of crack-free AlxGa1-xN/GaN distributed Bragg reflectors (DBRs) with high-Al composition (x=0.5). This is achieved by introducing a thick AlN interlayer and strain mediating Aly ...
InGaN/GaN quantum wells (QWs) were grown by molecular-beam epitaxy on c-plane sapphire substrates. The growth of InGaN is carried out at 550 degrees C with a large V/III ratio to counteract the low efficiency of NH3 at that temperature and to promote the t ...
Ammonia is used for growing undoped GaN layers by gas source molecular-beam epitaxy on c-plane sapphire substrates. The growth mode is layer by layer as shown by the observation of reflection high-energy electron diffraction intensity oscillations. The str ...
GaN and InGaN alloys were grown on c-plane sapphire substrates by molecular beam epitaxy using NH3. This allows realizing light emitting diodes (LEDs) based on InGaN/GaN single heterostructures. The forward voltage is 3.6 V at 20 mA. The room temperature e ...
