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Doping of silicon via phosphine exposures alternating with molecular beam epitaxy overgrowth is a path to Si:P substrates for conventional microelectronics and quantum information technologies. The technique also provides a well-controlledmaterial for systematic studies of two-dimensional lattices with a half-filled band. We show here that for a dense (n(s) = 2.8 x 10(14) cm(-2)) disordered two-dimensional array of P atoms, the full field magnitude and angle-dependent magnetotransport is remarkably well described by classic weak localization theory with no corrections due to interaction. The two-to three-dimensional crossover seen upon warming can also be interpreted using scaling concepts developed for anistropic three-dimensionalmaterials, whichwork remarkably exceptwhen the applied fields are nearly parallel to the conducting planes.
Harald Brune, François Patthey, Stefano Rusponi, Marina Pivetta, Edgar Fernandes, Fabio Donati, Aparajita Singha, Denis Krylov
Tobias Kippenberg, Rui Ning Wang, Anat Siddharth, Arslan Sajid Raja