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Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Publications associées (45)

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Printed ecoresorbable temperature sensors for environmental monitoring

Danick Briand, Nicolas Francis Fumeaux, James Alec Pierce Bourely, Melissa Kossairi

Abstract Electronic waste has become a pressing issue, necessitating sustainable solutions for the disposal of electronic devices. While the development of environmentally degradable electronics has gained attention, the fabrication of stable and performan ...

2023

Photochemical Alkynylations with Hypervalent Iodine Reagents

Stephanie Grace Elizabeth Amos

Over the past twenty years, photochemical transformations have gained in importance in organic chemistry. Indeed, the development of photocatalysts has allowed the use of visible light as an energy source for chemical transformations. More specifically, ph ...

EPFL2022

In the framework of the Dark Skies Rangers project, we have developed a light pollution simulator aimed at demonstrating the impact of artificial light on the observation of the night sky. The simulator illustrates a nocturnal countryside scenery, with a h ...

2019

High power modular LED-based illumination system for lithography applications

Hans Peter Herzig, Marcel Groccia, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

2018

High power ultraviolet LED illumination systems: coherence properties and applications in photolithography

Johana Bernasconi

Mask-aligner photolithography is a technology used to replicate patterns from a mask to a photosensitive substrate. It is widely used in the fabrication of MEMS and micro-optical components, and for other applications with dimensions in the micrometer rang ...

EPFL2018

High-power modular LED-based illumination systems for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

2018

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

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For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional element ...

IEEE2018

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We introduce a novel industrial grade 193nm continuous-wave laser light source for proximity mask-aligner lithography. A diode seed laser in master-oscillator power-ampliﬁcation conﬁguraton is frequency-quadrupled using lithiumtriborate and potassium-ﬂuoro ...

2018

Spurred on by the invention of the blue light-emitting diode ( LED) a quarter of a century ago, the LED industry has advanced dramatically and has revolutionized the signaling/signage, mobile and flat panel display, and more recently, general lighting mark ...

Optical Soc Amer2017