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Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Publications associées (45)

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Limitations of Proximity Lithography Printing

Krishnaparvathy Puthankovilakam

Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

EPFL2017

Unified rule based correction for corners in proximity lithography mask using high resolution features

Hans Peter Herzig, Toralf Scharf, Krishnaparvathy Puthankovilakam

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

Highly-sensitive distributed birefringence measurements based on a two-pulse interrogation of a dynamic Brillouin grating

Luc Thévenaz, Marcelo Alfonso Soto Hernandez, Andrey Denisov

A method for distributed birefringence measurements is proposed based on the interference pattern generated by the interrogation of a dynamic Brillouin grating (DBG) using two short consecutive optical pulses. Compared to existing DBG interrogation techniq ...

Ieee2017

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In proximity lithography, interference and diffraction effects arise when printing small features because of the proximity gap. Different techniques are used in order to control and take advantage of theses effects. In this paper, the focus is set on the M ...

Spie-Int Soc Optical Engineering2016

Development of a Localization System Based on VLC Technique for an Indoor Environment

Kwang Moo Yi

In this paper, we develop an indoor localization device which embeds localization information into indoor light-emitting-diodes (LED) lighting systems. The key idea of our device is the use of the newly proposed "bit stuffing method". Through the use of st ...

Korean Inst Electr Eng2015

Light wavelength-dependent E. coli survival changes after simulated solar disinfection of secondary effluent

César Pulgarin, Sami Rtimi, Stefanos Giannakis

In this study, the photoreactivation and the modification of dark repair of E. coli in a simulated secondary effluent were investigated after initial irradiation under different conditions. The simulated solar exposure of the secondary wastewater was follo ...

Royal Society of Chemistry2015

Today, the challenges of sustainable development require revisiting all the parameters of architectural design. According to the International Energy Agency , in 2005, 19% of the electricity produced in the world was consumed for lighting. We know that the ...

2014

ITER will operate long-time discharges (400 s) at high performances (Q = 10) and will have to satisfy strong safety and operational limits in term of tritium and dust inventory. This implies to control the erosion of the plasma facing components. Erosion m ...

Ieee-Inst Electrical Electronics Engineers Inc2014

On Micro Optical Elements for Efficient Light Diffusion

Roland Andreas Bitterli

Efficient light management is one of the key issues in modern energy conversion systems, be it to collect optical power or to redistribute light generated by high power light emitters. This thesis touches mainly on the subject of efficient light redistribu ...

EPFL2013

A High-Efficiency Nonuniform Grating Coupler Realized With 248-nm Optical Lithography

Christophe Marcel Georges Galland, Yang Liu

We describe a high-efficiency grating coupler (GC) fabricated on a silicon-on-insulator wafer with 220 nm top silicon layer. One single 60 nm shallow etch is required to define the diffractive gratings with a minimum lithographic feature size of 180 nm, wh ...

Institute of Electrical and Electronics Engineers2013