Êtes-vous un étudiant de l'EPFL à la recherche d'un projet de semestre?
Travaillez avec nous sur des projets en science des données et en visualisation, et déployez votre projet sous forme d'application sur Graph Search.
This work investigates and reports on the radio-frequency (RF) behavior in the frequency range of 5 – 35 GHz of germanium-doped (Ge-doped VO2) vanadium dioxide thin films, deposited on silicon substrates via sputtering and pulsed laser deposition (PLD) with estimated Ge concentrations of 5 % and 5.5 %. Both films exhibit critical transition temperatures (Tc) of 76.2 and 72 °C, respectively, which are higher compared to that of the undoped VO2 which undergoes reversible insulator-to-metal phase transition at 68°C. Both types of Ge-doped films show low hysteresis (< 5 °C) in their conductivity versus temperature characteristics and preserve an high off-state DC-conductivities (corresponding to the insulating state of the phase change material) of 13 S/m, for the sputtered, and, 55 S/m, for the PLD deposited film, respectively. The DC on-state (corresponding to the conductive state of the phase change material) conductivity reaches 145,000 S/m in the case of the PLD film, which represents a significant increase compared to the state-of-the art values measured for undoped VO2 thin films deposited on identical substrates. In order to further understand the off-state dissimilarities and RF behavior of the deposited Ge-doped VO2 films, we propose an original methodology for the experimental extraction of the dielectric constant (ɛr) in the GHz range of the films below 60 °C. This is achieved by exploiting the frequency shift of resonant filters. For this purpose we have fabricated coplanar waveguide (CPW) structures incorporating ultra-compact Peano space filling curves, each resonating at a different frequency between 5 and 35 GHz on two types of substrates, one with the Ge-doped VO2 thin films and another one using only SiO2 to serve as reference. The reported results and analysis contribute to the advancement of the field of metal-insulator-transition material technology with high Tc for RF industrial applications.
Duncan Alexander, Bernat Mundet, Jean-Marc Triscone