Wafer-Scale Fabrication of Nanopore Devices for Single-Molecule DNA Biosensing using MoS2
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Photoresist-based lithography has major limitations when applied to micro-electro-mechanical systems (MEMS) with mechanically fragile and/or chemically functionalised surfaces. As a remedy, alternative, complementary nanopatterning methods have been develo ...
The endeavour to develop nanodevices demands for patterning methods in the nanometer scale. The continuous improvement in lithography methods based on deep UV (DUV), X-ray, or electron beam exposure allow for further progress in integrated circuit hardware ...
Single crystals of layered semiconductors such as WS2 and MoS2 have already proven their efficiency as active elements in photovoltaic cells. Due to their high optical absorption coefficient in the visible range, these materials could be used in the form o ...
In the past, conducting AFM probes have been made by coating standard Si-cantilevers and tips with a thin film of e.g. tungsten (W). Here, we describe a new AFM probe made entirely out of tungsten. The fabrication involves microfabrication techniques such ...
A carbon-based interdigitated electrode array (IDA) was fabricated by photolithographic patterning of RF sputtered thin-film carbon layers. The IDAs consisted of 125 pairs having the finger width of 2.5 μm and 1.5 μm gap. The electrochemical behavior of th ...
We discuss recent theoretical results on the polariton parametric amplification from semiconductor microcavities in the strong exciton-photon coupling regime. A microscopic treatment of the interacting polariton system leads to a clear description of the p ...
A study on the effect of growth interruptions on InAs/InP strained quantum wells (QW) by cathodoluminescence (CL) at helium temperature and transmission electron microscopy (TEM) is reported. The samples are grown by chemical beam epitaxy (CBE) with and wi ...
Platinum silicide films are widely used in silicon devices for ohmic and Schottky contacts. It has been demonstrated in the recent years that Schottky barriers employing ultra-thin platinum silicide films (thickness < 10 nm) are useful for photodetection i ...