Simulation of silicon KOH and dry etching methods for micromould fabrication
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The present thesis deals with new composite photoresists for the UV-LIGA and microstereolithography microfabrication processes. The aim is to build functional 3D objects, with high aspect ratio. Two projects have been investigated in parallel for each micr ...
The low frequency noise of lattice-matched InP-based HEMTs gate recess etched with CH4/H2 RIE and phosphoric-acid based wet etchants was studied at different gate and drain biases in a temperature range of 77 K to 340 K. The measurements showed a significa ...
We present a simple method for fabricating nanomechanical elements with ultra high resonance frequency. The process is based on local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the sub ...
A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes a ...
The low frequency noise of lattice-matched InP-based HEMTs gate recess etched with CH4/H2 RIE and phosphoric-acid based wet etchants was studied at different gate and drain biases in a temperature range of 77 K to 340 K. The measurements showed a significa ...
We present powder blasting as a new technology for the realization of Micro Electro-Mechanical Systems (MEMS). The technique is base don the erosion of a masked substrate by a high velocity powder beam. We study the erosion rate of the process using glass ...
The low-frequency noise of lattice-matched InAlAs/InGaAs/InP high electron mobility transistors (HEMT's) gate recess etched with a highly selective dry etching process and with conventional wet etching were studied at different gate and drain biases for th ...
Institute of Electrical and Electronics Engineers1998
Our recent developments concerning the fabrication of polymer microchips and their applications for biochemical analyses are reviewed. We first describe two methods of fabrication of polymer microfluidic chips, namely UV-laser photoablation and plasma etch ...
We present a simple method for fabricating fast resonating (90 MHz) nanomechanical elements based on the local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The measured re ...
The flexibility of the new available Inductively Coupled Plasma (ICP) reactors provides a lot of possibilities for process development in dry etching field. Deep anisotropic etching of silicon is now possible under control (etch rate, profiles, uniformity) ...
