Overview on recent progress in magnetron injection gun theory and design for high power gyrotrons
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Focused Electron Beam Induced Processing (FEBIP) is a technique used for etching and deposition of micro- and nano-structures using a focused electron beam. FEBIP is commonly carried out in a Scanning Electron Microscope (SEM) with a Gas Injection System ( ...
Experimental and simulation results of an electron gun test facility, based on pulsed diode acceleration followed by a two-cell rf cavity at 1.5 GHz, are presented here. The main features of this diode-rf combination are: a high peak gradient in the diode ...
A different approach in microcolumn design is presented, aiming at a large number of pixels at minimal probe size for the deflected beam. An optimization routine resulted in a seven times magnifying column featuring a more than 7×7 mm2 scan field at 40 mm ...
We use the cathodoluminescence mode of a scanning electron microscope to investigate the depth and lateral dependencies of the electron-hole pairs generation by the electron beam in Al0.4Ga0.6As semiconducting material. A multiquantum well structure acts a ...
Focused electron- and ion-beam induced processing are well established techniques for local deposition and etching that rely on decomposition of precursor molecules by irradiation. These high-resolution nanostructuring techniques have various applications ...
The knowledge of the inelastic double differential scattering cross section (DDSCS) is of utmost importance for microanalysis in electron energy loss spectrometry (EELS) in the electron microscope and for the investigation of electron energy loss near edge ...
A large number of characterization tools for semiconductor based heterostructures are available nowadays. Most of these techniques deliver high temporal resolution (down to hundreds of femtoseconds) or good spatial resolution (down to sub nanometer resolut ...
We have developed an original time resolved cathodoluminescence (TRCL) set-up with temporal performances similar to those of conventional time resolved optical techniques, keeping the capability to get structural information through the secondary electron ...
The use of electron energy loss spectroscopy (EELS) in determining the electronic properties of Si and thickness dependent loss function of Si with 0.14 eV energy resolution were investigated. The dielectric response function was used to describe the inter ...
The focused electron beam induced deposition process is a promising technique for nano and micro patterning. Electrons can be focused in sub-angström dimensions, which allows atomic-scale resolution imaging, analysis, and processing techniques. Before the ...