Publication
Dust particle diagnostics in rf plasma deposition of silicon and silicon oxide films
Publications associées (65)
Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Estelle Wagner, Giacomo Benvenuti
Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and de ...
2011Nutrient stoichiometry in Sphagnum along a nitrogen deposition gradient in highly polluted region of Central-East Europe
We investigated the variation of N:P and N:K ratio in ombrotrophic Sphagnum plants along a gradient of atmospheric N deposition from 1 to 2.5 g m(-2) year(-1) in Central-East Europe. The N:P and N:K ratio in Sphagnum capitula increased significantly along ...
2011Impact of secondary gas-phase reactions on microcrystalline silicon solar cells deposited at high rate
Christophe Ballif, Grégory Bugnon, Andrea Feltrin, Thomas Söderström, Benjamin Strahm, Gaetano Parascandolo
The role of secondary gas-phase reactions during plasma-enhanced chemical vapor deposition of microcrystalline silicon is a controversial subject. In this paper, we show that the enhancement of such reactions is associated with the improvement of material ...
American Institute of Physics2010Oxygen permeation, mechanical and structural properties of multilayer diffusion barrier coatings on polypropylene
Yves Leterrier, Judith Helen Waller
To improve temperature durability for autoclaving of SiOx diffusion barrier coatings on polypropylene, plasma polymerized hexamethyldisiloxane (pp-HMDSO) is applied by plasma enhanced chemical vapour deposition as interlayer material and compared with resu ...
Institute of Physics2010Non-intrusive plasma diagnostics for the deposition of large area thin film silicon
Christoph Hollenstein, Alan Howling, Benjamin Strahm
Plasma diagnostics for large area, industrial RF parallel-plate reactors can be useful for process optimization and monitoring, provided that their implementation is practical and non-intrusive. For instance, Fourier transform infrared (FTIR) absorption sp ...
Elsevier2009Single-photon and photon-number-resolving detectors based on superconducting nanowires
Nanowire superconducting single photon detectors (SSPDs) [1] are characterized by very high sensitivity in the near infrared (detection efficiency η up to 30%, for a dark count rate DK of few Hz), speed (up to ∼1 GHz repetition rate) and time resolution (j ...
EPFL2009High quality superconducting NbN thin films on GaAs
Francis Lévy, Alessandro Surrente, Francesco Marsili, Alessandro Gaggero
A very promising way to increase the detection efficiency of nanowire superconducting single-photon detectors (SSPDs) consists in integrating them with advanced optical structures such as distributed Bragg reflectors (DBRs) and optical waveguides. This req ...
2009Far-infrared sensor with LPCVD-deposited low-stress Si-rich nitride absorber membrane—Part 1. Optical absorptivity
This is the first part of the two articles reporting investigation of a thermal detector-type far-infrared sensor operating in the 8–14µm wavelength, using Low-Pressure-Chemical-Vapor-Deposition (LPCVD)- deposited low-stress Si-rich nitride (SiN)membrane a ...
2009Design, characterisation and modelling of a high current DC arc plasma source for silicon and silicon carbide processing at low pressure
In the frame of this thesis, two similar high current DC arc (HCDCA) plasma sources were investigated in a low gas pressure regime (10-3-10-2 mbar). One of them was initially designed for the epitaxial growth of silicon and silicon germanium (LEP), the oth ...
EPFL2008Electrospray ion beam deposition and mass spectrometry of nonvolatile molecules and nanomaterials
The vacuum deposition of complex functional molecules and nanoparticles by thermal sublimation is often hindered due to their extremely low vapor pressure. This especially impedes the application of ultrahigh vacuum (UHV) based analytical and surface modif ...
EPFL2008